Title:
SHOWERHEAD AND SUBSTRATE PROCESSING APPARATUS INCLUDING SAME
Document Type and Number:
WIPO Patent Application WO/2023/080368
Kind Code:
A1
Abstract:
The present invention relates to a showerhead and a substrate processing apparatus including same. A gas spray hole for spraying a reaction gas onto a substrate is formed at an angle in the showerhead so that the distance, that is, the process gap, between the substrate and the spray surface of the showerhead can be reduced, thus improving the productivity of a film deposition process. By reducing the distance, that is, the process gap, between the substrate and the spray surface of the showerhead, it is possible to: reduce the amount of gas used; shorten the time it takes to remove unnecessary reaction gases and by-products in a space; and reduce running costs by reducing the amount of reaction gas used.
Inventors:
SEO DONG WON (KR)
KIM SANG YEOP (KR)
RYU HUI SEONG (KR)
LEE BAEK JU (KR)
CHO HYUN CHUL (KR)
CHEON MIN HO (KR)
HAN PIL HEE (KR)
KIM SANG YEOP (KR)
RYU HUI SEONG (KR)
LEE BAEK JU (KR)
CHO HYUN CHUL (KR)
CHEON MIN HO (KR)
HAN PIL HEE (KR)
Application Number:
PCT/KR2022/006541
Publication Date:
May 11, 2023
Filing Date:
May 09, 2022
Export Citation:
Assignee:
HANWHA CORP (KR)
International Classes:
C23C16/455; C23C16/458; H01J37/32
Foreign References:
| KR20190056112A | 2019-05-24 | |||
| KR20200032312A | 2020-03-26 | |||
| US20160230278A1 | 2016-08-11 | |||
| KR102238016B1 | 2021-04-08 | |||
| CN111785604A | 2020-10-16 |
Attorney, Agent or Firm:
THEHO PATENT & LAW FIRM (KR)
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