SHOWERHEAD AND SUBSTRATE PROCESSING APPARATUS

WIPO Patent Application WO/2019/066299

A1

According to one embodiment of the present invention, a substrate processing apparatus comprises: a chamber in which a process for a substrate is performed; a showerhead provided inside the chamber so as to spray a reaction gas toward the substrate; and a susceptor provided below the showerhead and supporting the substrate, wherein the showerhead includes: a showerhead body having an inner space, to which a reaction gas is supplied from the outside, and a plurality of spray holes communicating with the inner space so as to spray the reaction gas therein; an inflow plate provided in the inner space so as to be capable of partitioning the inner space into an inflow space and a buffer space, and having a plurality of inflow ports communicating with the inflow space and the buffer space; and a plurality of adjusting plates, which are provided in the inflow ports and can move, and can restrict the movement of the reaction gas from the inflow space to the buffer space according to the distance from the inflow plate in accordance with the movement of the adjusting plates.

JPS61230829	STAGE DEVICE
WO/2020/103365	MICRO LED DISPLAY SUBSTRATE AND MANUFACTURING METHOD THEREOF
WO/2015/004262	APPARATUS FOR REMOVING A RING-SHAPED REINFORCEMENT EDGE FROM A GROUND SEMICONDUCTOR WAFER

JE SUNG TAE (KR)
PARK CHAN YONG (KR)
LEE JAE HO (KR)
JANG GIL SUN (KR)
YUN CHANG HOON (KR)
LIM HAN JUNE (KR)
KANG WOO YOUNG (KR)

PCT/KR2018/010493

April 04, 2019

September 07, 2018

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EUGENE TECHNOLOGY CO LTD (KR)

H01L21/67; H01L21/683

KR20080022699A	2008-03-12
KR20150004771A	2015-01-13
KR101560623B1	2015-10-15
KR101028407B1	2011-04-13
KR101027952B1	2011-04-12

JEONG, Seong-Jin (KR)

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