SHUTTER BLADE DEVICE FOR LITHOGRAPHY MACHINE - SHANGHAI MICRO ELECTRONICS EQUIPMENT GROUP CO LTD

Title:

SHUTTER BLADE DEVICE FOR LITHOGRAPHY MACHINE

Document Type and Number:

WIPO Patent Application WO/2019/007359

Kind Code:

A1

Abstract:

Disclosed is a shutter blade device for an exposure system of a lithography machine, the shutter blade device comprising two shutter blades (3, 4), and two thermal insulation plates (2), each shutter blade (3, 4) being connected to one thermal insulation plate (2). The conduction of heat from the blades (3, 4) to a shutter system is prevented by connecting the shutter blades (3, 4) and the thermal insulation plates (2), and the problem of the operation of a shutter system being unstable or a shutter system even being burned due to thermal conduction by the shutter is avoided.

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Inventors:

WANG YANFEI (CN)
LIU GUOGAN (CN)
ZHANG FUPING (CN)
JIA XIANG (CN)

Application Number:

PCT/CN2018/094462

Publication Date:

January 10, 2019

Filing Date:

July 04, 2018

Export Citation:

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Assignee:

SHANGHAI MICRO ELECTRONICS EQUIPMENT GROUP CO LTD (CN)

International Classes:

G03F7/20

Foreign References:

CN102087476A	2011-06-08
US4839679A	1989-06-13
CN104777716A	2015-07-15

Attorney, Agent or Firm:

SHANGHAI SAVVY INTELLECTUAL PROPERTY AGENCY (CN)

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