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Patent Searching and Data


Title:
SHUTTER DEVICE AND CONTROL METHOD THEREFOR, MASK ALIGNER AND EXPOSURE DOSE CONTROL METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2018/137676
Kind Code:
A1
Abstract:
Disclosed are a shutter device and a control method therefor, a mask aligner and an exposure dose control method therefor. The shutter device comprises: a light blocking unit and a voice coil electric motor (100), wherein the voice coil electric motor (100) comprises a permanent magnet module (110), a drive guide rail module (120) and coil structures (130). The coil structures (130) are arranged on the drive guide rail module (120). The permanent magnet module (110) generates a magnetic field inside the drive guide rail module (120). The light blocking unit comprises two shutter blades (200). The shutter blades (200) are connected to the coil structures (130). After being energised, the coil structures (130) generate magnetic fields the opposite of or the same as the magnetic field in the drive guide rail module (120), so that the coil structures (130) move forwards or reversely along the drive guide rail module (120) to drive the opening or closing of the two shutter blades (200). By means of directly connecting the coil structures (130) of the voice coil electric motor (100) to the light blocking unit, the opening and closing time of the shutter blades (200) is greatly reduced, thus increasing a small-dose exposure yield and increasing the light source utilisation rate in unit time.

Inventors:
JIANG ZHIYONG (CN)
ZHANG FUPING (CN)
WANG YANFEI (CN)
Application Number:
PCT/CN2018/074089
Publication Date:
August 02, 2018
Filing Date:
January 25, 2018
Export Citation:
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Assignee:
SHANGHAI MICRO ELECTRONICS EQUIPMENT GROUP CO LTD (CN)
International Classes:
G03B9/08; G03F7/20
Foreign References:
CN1049918A1991-03-13
CN102087476A2011-06-08
CN102540633A2012-07-04
US20140146378A12014-05-29
CN101351769A2009-01-21
US4265530A1981-05-05
Other References:
See also references of EP 3575861A4
Attorney, Agent or Firm:
SHANGHAI SAVVY INTELLECTUAL PROPERTY AGENCY (CN)
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