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Title:
SILICA-BASED CHIRAL NANOSTRUCTURES AND PROCESSES FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2012/108300
Kind Code:
A1
Abstract:
Silica-based chiral nanostructures each comprising or obtained from a silica/organic-substance composite having chirality are provided, the nanostructures being obtained through a step in which an aqueous solution of a polymer having a linear polyethyleneimine skeleton is mixed with an aqueous solution of an optically active tartaric acid to obtain chiral crystals of an acid-base complex and a step in which a silica source is subjected, in the presence of the chiral crystals obtained in that step, to a sol-gel reaction to coat the chiral crystals with silica to which the chiral structure of the chiral crystals has been transferred. The structures are silica-based chiral nanostructures which are stable even to high-temperature burning. The structures can be converted to organic-silane-modified silica-based chiral nanostructures by bonding an organic silane to the silica.

Inventors:
JIN REN-HUA (JP)
MATSUKIZONO HIROYUKI (JP)
Application Number:
PCT/JP2012/052088
Publication Date:
August 16, 2012
Filing Date:
January 31, 2012
Export Citation:
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Assignee:
KAWAMURA INST CHEM RES (JP)
JIN REN-HUA (JP)
MATSUKIZONO HIROYUKI (JP)
International Classes:
C08L79/02; B82Y20/00; B82Y40/00; C01B33/12; C08K3/36; C08K5/092; C07C59/255
Foreign References:
JP2006306711A2006-11-09
JP2001253705A2001-09-18
JP2006199523A2006-08-03
JP2012017233A2012-01-26
JP2011225694A2011-11-10
Attorney, Agent or Firm:
KONO MICHIHIRO (JP)
Michihiro Kono (JP)
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Claims: