Title:
SILICA BASED POROUS FILM, ARTICLE WITH SILICA BASED POROUS FILM AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2014/061605
Kind Code:
A1
Abstract:
Provided are: a silica based porous film which is capable of maintaining a porous structure over a long period of time even when directly formed on a glass plate and has excellent antireflection performance and durability; an article with a silica based porous film which comprises the silica based porous film; and a method for easily producing the article with the silica based porous film. This silica based porous film comprises multiple holes in a matrix for which silica is the main component and is characterized in that the refractive index of the silica based porous film is in the range of 1.10-1.38, the holes include holes which have a diameter of 20 nm or more, the uppermost surface of the silica based porous film comprises an uppermost surface dense layer and the number of holes with a diameter of 20 nm or more that open to the uppermost surface of the uppermost surface dense layer is 13 holes/106nm2 or less.
Inventors:
KAWAI YOHEI (JP)
YONEDA TAKASHIGE (JP)
ABE KEISUKE (JP)
YONEDA TAKASHIGE (JP)
ABE KEISUKE (JP)
Application Number:
PCT/JP2013/077814
Publication Date:
April 24, 2014
Filing Date:
October 11, 2013
Export Citation:
Assignee:
ASAHI GLASS CO LTD (JP)
International Classes:
C01B33/12; B32B5/18; B32B9/00; G02B1/11
Foreign References:
| JP2004182491A | 2004-07-02 | |||
| JP2009237551A | 2009-10-15 | |||
| JP2006215542A | 2006-08-17 | |||
| JP2010509175A | 2010-03-25 | |||
| JP2003054996A | 2003-02-26 | |||
| JP2010503033A | 2010-01-28 | |||
| JP2006335605A | 2006-12-14 |
Attorney, Agent or Firm:
SENMYO, Kenji et al. (JP)
Spring name Kenji (JP)
Spring name Kenji (JP)
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