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Title:
SILICA-COATING-FORMING COMPOSITION FOR USE WITH INKJETS, METHOD FOR FORMING SILICA COATING, SEMICONDUCTOR DEVICE, AND SOLAR-CELL SYSTEM
Document Type and Number:
WIPO Patent Application WO/2012/144291
Kind Code:
A1
Abstract:
The present invention relates to a silica-coating-forming composition for use with inkjets, said composition containing the following: a silicon compound obtained by hydrolytic polycondensation of a compound represented by the general formula R1 nSiX4−n (R1 representing a C1-20 organic group, X representing a hydrolyzable group, and n representing an integer from 0 to 2); solvents including gamma-butyrolactone, a second solvent having a boiling point of 80°C to 100°C, and a third solvent having a boiling point of 180°C to 230°C; and a surface conditioner. Gamma-butyrolactone constitutes at least 20% of the total mass of the solvents, and the second solvent constitutes 20% to 50% of the total mass of the solvents.

Inventors:
OKADA YUUHEI (JP)
YOSHIKAWA TAKAHIRO (JP)
NOBE SHIGERU (JP)
Application Number:
PCT/JP2012/057555
Publication Date:
October 26, 2012
Filing Date:
March 23, 2012
Export Citation:
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Assignee:
HITACHI CHEMICAL CO LTD (JP)
OKADA YUUHEI (JP)
YOSHIKAWA TAKAHIRO (JP)
NOBE SHIGERU (JP)
International Classes:
C09D11/00; B41M5/00; H01L21/312; H01L31/04
Foreign References:
JP2001279134A2001-10-10
JP2003253203A2003-09-10
JP2005200469A2005-07-28
JP2007211081A2007-08-23
JP2008120992A2008-05-29
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (JP)
Yoshiki Hasegawa (JP)
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Claims: