Title:
SILICA DISPERSION, METHOD FOR PRODUCING SAME, PHOTOCURABLE COMPOSITION IN WHICH SAME IS USED, AND CURED PRODUCT THEREOF
Document Type and Number:
WIPO Patent Application WO/2020/017277
Kind Code:
A1
Abstract:
A silica dispersion in which surface-treated sol-gel silica particles are dispersed in a liquid compound having radical polymerizable unsaturated bonds, wherein the surface-treated sol-gel silica is a product of surface treatment by at least one of an organic silicon compound having prescribed (meth)acrylic groups and a (partial) hydrolysis-condensation product thereof, the product of surface treatment being obtained by adding 10 parts by mass or more of the organic silicon compound having prescribed (meth)acrylic groups per 100 parts by mass of the sol-gel silica particles into a dispersion containing sol-gel silica particles having a median diameter of 1-60 nm in the volume-based grain size distribution.
Inventors:
YOSHII RYOSUKE (JP)
MATSUMURA KAZUYUKI (JP)
MATSUMURA KAZUYUKI (JP)
Application Number:
PCT/JP2019/025892
Publication Date:
January 23, 2020
Filing Date:
June 28, 2019
Export Citation:
Assignee:
SHINETSU CHEMICAL CO (JP)
International Classes:
C08F290/14; C01B33/145; C09C3/12; C09D7/62; C09D201/00
Domestic Patent References:
| WO2014171485A1 | 2014-10-23 | |||
| WO2015087965A1 | 2015-06-18 | |||
| WO2018003880A1 | 2018-01-04 |
Foreign References:
| JPH11124467A | 1999-05-11 | |||
| JP2004307659A | 2004-11-04 | |||
| JP2011162765A | 2011-08-25 | |||
| JP2013241515A | 2013-12-05 | |||
| JP2005272792A | 2005-10-06 | |||
| CN105693927A | 2016-06-22 | |||
| JP2016132713A | 2016-07-25 |
Attorney, Agent or Firm:
PATENT PROFESSIONAL CORPORATION EI-MEI PATENT OFFICE (JP)
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