Title:
SILICA GLASS FOR HIGH-FREQUENCY DEVICES, AND HIGH-FREQUENCY DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/093182
Kind Code:
A1
Abstract:
A silica glass for high-frequency devices, which has an OH group concentration of 300 wtppm or less and has a FQ value of 90000 GHz or more at a frequency of 25 to 30 GHz inclusive, wherein, when the FQ value in a frequency range of 20 to 100 GHz inclusive is approximated as a linear function of frequency, the slope of the linear function is 1000 or more. A high-frequency device manufactured using the silica glass.
Inventors:
KIDERA NOBUTAKA (JP)
SASAKI KAZUYA (JP)
IWAHASHI YASUTOMI (JP)
SASAKI KAZUYA (JP)
IWAHASHI YASUTOMI (JP)
Application Number:
PCT/JP2018/040155
Publication Date:
May 16, 2019
Filing Date:
October 29, 2018
Export Citation:
Assignee:
AGC INC (JP)
International Classes:
C03C3/06; C03C4/16; H01P1/207; H01P3/12; H01P7/06
Foreign References:
| JPH07330357A | 1995-12-19 | |||
| JP2004099376A | 2004-04-02 | |||
| US20170215270A1 | 2017-07-27 |
Attorney, Agent or Firm:
ITOH, Tadashige et al. (JP)
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