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Patent Searching and Data


Title:
SILICA GLASS FOR HIGH-FREQUENCY DEVICES, AND HIGH-FREQUENCY DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/093182
Kind Code:
A1
Abstract:
A silica glass for high-frequency devices, which has an OH group concentration of 300 wtppm or less and has a FQ value of 90000 GHz or more at a frequency of 25 to 30 GHz inclusive, wherein, when the FQ value in a frequency range of 20 to 100 GHz inclusive is approximated as a linear function of frequency, the slope of the linear function is 1000 or more. A high-frequency device manufactured using the silica glass.

Inventors:
KIDERA, Nobutaka (5-1 Marunouchi 1-chome, Chiyoda-k, Tokyo 05, 〒1008405, JP)
SASAKI, Kazuya (1-8, Machiikedai, Koriyama Cit, Fukushima 15, 〒9630215, JP)
IWAHASHI, Yasutomi (1-8, Machiikedai, Koriyama Cit, Fukushima 15, 〒9630215, JP)
Application Number:
JP2018/040155
Publication Date:
May 16, 2019
Filing Date:
October 29, 2018
Export Citation:
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Assignee:
AGC INC. (5-1 Marunouchi 1-chome, Chiyoda-ku Tokyo, 05, 〒1008405, JP)
International Classes:
C03C3/06; C03C4/16; H01P1/207; H01P3/12; H01P7/06
Foreign References:
JPH07330357A1995-12-19
JP2004099376A2004-04-02
US20170215270A12017-07-27
Attorney, Agent or Firm:
ITOH, Tadashige et al. (16th Floor, Marunouchi MY PLAZA 1-1, Marunouchi 2-chome, Chiyoda-k, Tokyo 05, 〒1000005, JP)
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