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Patent Searching and Data


Title:
SILICON CARBIDE SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SAME
Document Type and Number:
WIPO Patent Application WO/2018/043300
Kind Code:
A1
Abstract:
According to the present invention, when the film thickness of a p-type base region (3) is measured, an infrared light is irradiated from a p-type base region (3) side to an n+-type substrate (1) on which the p-type base region (3) and n--type drift layer (2) are grown. Reflection light from an interface between the p-type base region (3) and the n--type drift layer (2) is not used, but inference light made by reflection light from the surface of the p-type base region (3) and reflection light from an interface between the n--type drift layer (2) and the n+-type substrate (1) is measured. This makes it possible to measure a bi-layered film thickness T2, which is a summed thickness of the p-type base region (3) and the n--type drift layer (2). Accordingly, the film thickness of the p-type base region (3) can be calculated by subtracting a mono-layered film thickness T1 of the n-type drift layer (2) from the bi-layered film thickness T2.

Inventors:
AMANO Akira (Showa-cho Kariya-cit, Aichi 61, 〒4488661, JP)
SATOMURA Takayuki (Showa-cho Kariya-cit, Aichi 61, 〒4488661, JP)
TAKEUCHI Yuichi (Showa-cho Kariya-cit, Aichi 61, 〒4488661, JP)
SUZUKI Katsumi (Toyota-cho Toyota-sh, Aichi 71, 〒4718571, JP)
AOI Sachiko (Yokomichi Nagakute-sh, Aichi 92, 〒4801192, JP)
Application Number:
JP2017/030407
Publication Date:
March 08, 2018
Filing Date:
August 24, 2017
Export Citation:
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Assignee:
DENSO CORPORATION (1-1 Showa-cho, Kariya-city Aichi, 61, 〒4488661, JP)
TOYOTA JIDOSHA KABUSHIKI KAISHA (1 Toyota-cho, Toyota-shi Aichi, 71, 〒4718571, JP)
International Classes:
H01L21/336; G01B11/06; H01L21/66; H01L29/12; H01L29/78
Foreign References:
JP2015072999A2015-04-16
JPH10223715A1998-08-21
JP2003065724A2003-03-05
JP2009302133A2009-12-24
JP2014236189A2014-12-15
Attorney, Agent or Firm:
YOU-I PATENT FIRM (Nagoya Nishiki City Bldg. 4F 1-6-5, Nishiki Naka-ku, Nagoya-sh, Aichi 03, 〒4600003, JP)
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