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Title:
SILICON-CONTAINING COMPOSITION FOR FORMATION OF RESIST UNDERLAYER FILM, WHICH CONTAINS ORGANIC GROUP CONTAINING PROTECTED ALIPHATIC ALCOHOL
Document Type and Number:
WIPO Patent Application WO/2012/039337
Kind Code:
A1
Abstract:
[Problem] To provide a composition for forming an underlayer film for a lithographic resist, which can be used for forming an underlayer film for a solvent-developable resist that can be used as a hard mask. [Solution] A composition for forming an underlayer film for a solvent-developable resist, which comprises a hydrolysable organosilane which has an organic group containing a protected aliphatic alcohol group and capable of binding to a silicon atom, a hydrolysis product or hydrolysis condensation product of the hydrolysable organosilane or a combination thereof and a solvent, wherein preferably the hydrolysable organosilane, a hydrolysis product or hydrolysis condensation product of the hydrolysable organosilane or a combination thereof is contained as a silane compound, and wherein silicon atoms are contained in the silane compound which has an organic group containing a protected aliphatic alcohol group and capable of binding to a silicon atom in an amount of 0.1 to 40 mol% relative to the total amount of the silicon atoms contained in the composition; and a method for forming an underlayer film for a resist, which is produced by applying the composition for forming an underlayer film onto a semiconductor substrate and burning the composition-applied semiconductor substrate.

Inventors:
TAKEDA SATOSHI (JP)
NAKAJIMA MAKOTO (JP)
KANNO YUTA (JP)
Application Number:
PCT/JP2011/071013
Publication Date:
March 29, 2012
Filing Date:
September 14, 2011
Export Citation:
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Assignee:
NISSAN CHEMICAL IND LTD (JP)
TAKEDA SATOSHI (JP)
NAKAJIMA MAKOTO (JP)
KANNO YUTA (JP)
International Classes:
G03F7/11; G03F7/26; G03F7/32; H01L21/027
Foreign References:
JP2009237363A2009-10-15
JP2009229708A2009-10-08
JP2008309929A2008-12-25
JP2008158002A2008-07-10
JP2007065161A2007-03-15
JP2006285095A2006-10-19
JP2005048152A2005-02-24
JP2008309879A2008-12-25
Attorney, Agent or Firm:
HANABUSA, Tsuneo et al. (JP)
Sepal Tsuneo (JP)
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