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Patent Searching and Data


Title:
SILICON METAL OXIDE ENCAPSULATION FILM COMPRISING METAL OR METAL OXIDE IN THIN FILM, AND MANUFACTURING METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2020/184910
Kind Code:
A1
Abstract:
The present invention relates to a silicon oxide encapsulation film comprising a metal or a metal oxide, and a manufacturing method therefor. The silicon metal oxide encapsulation film according to the present invention has a high thin film growth rate and low moisture and oxygen permeabilities, thereby exhibiting a very excellent sealing effect even at a low thickness, and the stress strength and refractive index thereof can be controlled, thereby enabling a high-quality silicon metal oxide encapsulation film that is applicable to a flexible display to be readily manufactured.

Inventors:
KIM MYOUNG WOON (KR)
LEE SANG ICK (KR)
JANG SE JIN (KR)
KIM SUNG GI (KR)
PARK JEONG JOO (KR)
CHAE WON MOOK (KR)
CHO A RA (KR)
YANG BYEONG IL (KR)
PARK JOONG JIN (KR)
PARK GUN JOO (KR)
LEE SAM DONG (KR)
LIM HAENG DON (KR)
JEON SANG YONG (KR)
Application Number:
PCT/KR2020/003156
Publication Date:
September 17, 2020
Filing Date:
March 06, 2020
Export Citation:
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Assignee:
DNF CO LTD (KR)
International Classes:
H01L51/52; H01L21/02; H01L21/3065; H01L21/3213; H01L21/56; H01L51/56
Foreign References:
KR20150125941A2015-11-10
KR20170047417A2017-05-08
KR20140130016A2014-11-07
KR20180003287A2018-01-09
US20070207696A12007-09-06
Attorney, Agent or Firm:
PLUS INTERNATIONAL IP LAW FIRM (KR)
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