Title:
SILICON OXIDE-BASED MEMRISTOR BASED ON SOLUTION METHOD, AND PREPARATION METHOD AND APPLICATION THEREOF
Document Type and Number:
WIPO Patent Application WO/2021/003683
Kind Code:
A1
Abstract:
Disclosed are a silicon oxide-based memristor based on a solution method, and a preparation method and application thereof, said method comprising: (1) preparing a lower electrode on a substrate, or providing or directly preparing a lower electrode; (2) using a solution method, taking PHPS as a raw material, preparing an SiOx dielectric layer on the lower electrode to obtain an SiOx dielectric layer/lower electrode or SiOx dielectric layer/lower electrode/substrate; (3) after step (2) is completed, covering the SiOx dielectric layer with a mask, and preparing an upper electrode to obtain the silicon oxide-based memristor. The SiOx dielectric layer in the memristor obtained by the present invention is prepared using a PHPS solution method, the prepared thin film layer is dense and uniform, the adhesion between the SiOx dielectric layer and the electrode is good, and no cracks or holes are produced.
Inventors:
ZHANG ZONGBO (CN)
LI PENGFEI (CN)
XU CAIHONG (CN)
WANG DAN (CN)
LI PENGFEI (CN)
XU CAIHONG (CN)
WANG DAN (CN)
Application Number:
PCT/CN2019/095334
Publication Date:
January 14, 2021
Filing Date:
July 10, 2019
Export Citation:
Assignee:
INST CHEMISTRY CAS (CN)
International Classes:
H01L45/00
Foreign References:
| CN105745754A | 2016-07-06 | |||
| CN102544359A | 2012-07-04 | |||
| CN102931349A | 2013-02-13 | |||
| CN102931344A | 2013-02-13 |
Other References:
XU FINLAND: "SiO2 Memristor Based on Spin Coating and Its Resistance Property Analysis", CHINESE MASTER'S THESES FULL-TEXT DATABASE, no. 2, 1 December 2018 (2018-12-01), pages 1 - 65, XP055772427
XIAO, FENGYAN: "Preparation and Characterization of SiOx Coating from Perhydropolysilazane", RARE METAL MATERIALS AND ENGINEERING, vol. 42, no. S1, 30 June 2013 (2013-06-30), XP055772434, ISSN: 1002-185X
ZHANG ZONGBO , XIAO FENGYAN , LUO YONGMING , XU CAIHONG: "Research Progress in Perhydropolysilazane Coatings", PAINT & COATINGS INDUSTRY, vol. 43, no. 4, 1 April 2013 (2013-04-01), pages 74 - 79, XP055772469, ISSN: 0253-4312
WANG ZHONGWU, GUO SHUJING, LIANG QIANYING, DONG HUANLI, LI LIQIANG, ZHANG ZONGBO, XING FEIFEI, HU WENPING: "Ultrathin silica film derived with ultraviolet irradiation of perhydropolysilazane for high performance and low voltage organic transistor and inverter", SCIENCE CHINA MATERIALS, vol. 61, no. 9, 1 February 2018 (2018-02-01), pages 1237 - 1242, XP055772421, ISSN: 2095-8226, DOI: 10.1007/s40843-017-9216-2
XIAO, FENGYAN: "Preparation and Characterization of SiOx Coating from Perhydropolysilazane", RARE METAL MATERIALS AND ENGINEERING, vol. 42, no. S1, 30 June 2013 (2013-06-30), XP055772434, ISSN: 1002-185X
ZHANG ZONGBO , XIAO FENGYAN , LUO YONGMING , XU CAIHONG: "Research Progress in Perhydropolysilazane Coatings", PAINT & COATINGS INDUSTRY, vol. 43, no. 4, 1 April 2013 (2013-04-01), pages 74 - 79, XP055772469, ISSN: 0253-4312
WANG ZHONGWU, GUO SHUJING, LIANG QIANYING, DONG HUANLI, LI LIQIANG, ZHANG ZONGBO, XING FEIFEI, HU WENPING: "Ultrathin silica film derived with ultraviolet irradiation of perhydropolysilazane for high performance and low voltage organic transistor and inverter", SCIENCE CHINA MATERIALS, vol. 61, no. 9, 1 February 2018 (2018-02-01), pages 1237 - 1242, XP055772421, ISSN: 2095-8226, DOI: 10.1007/s40843-017-9216-2
Attorney, Agent or Firm:
BEIJING ORIGINTELLIGENCE IP LAW FIRM (CN)
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