Title:
SILICON OXIDE REMOVAL APPARATUS, AND INERT GAS COLLECTION FACILITY FOR SILICON MONOCRYSTAL PRODUCTION APPARATUS
Document Type and Number:
WIPO Patent Application WO/2011/016167
Kind Code:
A1
Abstract:
Disclosed is a silicon oxide removal apparatus for removing a silicon oxide from an inert gas that is discharged from a silicon monocrystal production apparatus, which is characterized by comprising at least a means for bringing the inert gas discharged from the silicon monocrystal production apparatus into contact with a strongly alkaline solution and a means for neutralizing an alkaline substance contained in the inert gas that has been brought into contact with the strongly alkaline solution. The silicon oxide removal apparatus enables, at low cost, the improvement in the effect of removing a silicon oxide from an inert gas that is discharged from a silicon monocrystal production apparatus. The silicon oxide removal apparatus also enables the reuse of the inert gas from which the silicon oxide has been removed effectively. Also disclosed is an inert gas collection facility for a silicon monocrystal production apparatus.
Inventors:
HIGUCHI, Takashi (Shin-Etsu Handotai Co. Ltd., 150, Aza Ohira, Oaza Odakura, Nishigo-mura, Nishishirakawa-gu, Fukushima 61, 〒9618061, JP)
樋口隆 (〒61 福島県西白河郡西郷村大字小田倉字大平１５０番地信越半導体株式会社 白河工場内 Fukushima, 〒9618061, JP)
樋口隆 (〒61 福島県西白河郡西郷村大字小田倉字大平１５０番地信越半導体株式会社 白河工場内 Fukushima, 〒9618061, JP)
Application Number:
JP2010/003548
Publication Date:
February 10, 2011
Filing Date:
May 27, 2010
Export Citation:
Assignee:
Shin-Etsu Handotai Co.,Ltd. (6-2 Ohtemachi 2-chome, Chiyoda-ku Tokyo, 04, 〒1000004, JP)
信越半導体株式会社 (〒04 東京都千代田区大手町二丁目６番２号 Tokyo, 〒1000004, JP)
HIGUCHI, Takashi (Shin-Etsu Handotai Co. Ltd., 150, Aza Ohira, Oaza Odakura, Nishigo-mura, Nishishirakawa-gu, Fukushima 61, 〒9618061, JP)
信越半導体株式会社 (〒04 東京都千代田区大手町二丁目６番２号 Tokyo, 〒1000004, JP)
HIGUCHI, Takashi (Shin-Etsu Handotai Co. Ltd., 150, Aza Ohira, Oaza Odakura, Nishigo-mura, Nishishirakawa-gu, Fukushima 61, 〒9618061, JP)
International Classes:
C30B29/06; C30B15/00; C30B35/00; F27B14/08; F27D17/00
Attorney, Agent or Firm:
YOSHIMIYA, Mikio (1st Shitaya Bldg. 8F, 6-11,Ueno 7-chome, Taito-k, Tokyo 05, 〒1100005, JP)
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