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Title:
SILICONE ADHESIVE FILM AND SEMICONDUCTOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2015/093329
Kind Code:
A1
Abstract:
A silicone adhesive film obtained by hydrosilylation, the B-stage, of a silicone composition comprising at least (A) an organopolysiloxane having a phenyl group and an alkenyl group, (B) an arbitrary diorganopolysiloxane having a phenyl group and an alkenyl group, (C) an organopolysiloxane having at least two silicon-bonded hydrogen atoms in each molecule thereof, (D) an adhesion promoter, and (E) a hydrosilylation catalyst. This B-stage silicone adhesive film softens readily and exhibits good gap-filling properties even in thermocompression bonding at relatively low temperature/pressure to an adherend having gaps on the surface thereof, and can harden and bond securely to the adherend.

Inventors:
FUJISAWA TOYOHIKO (JP)
YAMAZAKI HARUNA (JP)
YAMAZAKI RYOSUKE (JP)
YOSHITAKE MAKOTO (JP)
Application Number:
PCT/JP2014/082350
Publication Date:
June 25, 2015
Filing Date:
December 01, 2014
Export Citation:
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Assignee:
DOW CORNING TORAY CO LTD (JP)
International Classes:
C09J7/10; C09J11/06; C09J183/05; C09J183/07; H01L21/52
Foreign References:
JP2007246842A2007-09-27
JP2006063092A2006-03-09
JP2013518142A2013-05-20
JPH1112546A1999-01-19
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