Title:
SILSESQUIOXANE DERIVATIVE HAVING RADICAL POLYMERIZABLE FUNCTIONAL GROUP, COMPOSITION THEREOF, AND CURED FILM HAVING LOW CURE SHRINKAGE
Document Type and Number:
WIPO Patent Application WO/2018/131565
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a novel compound capable of imparting a low cure shrinkage while suppressing a decrease in the hardness (scratch resistance) of a cured film obtained from a resin composition. Provided is a silsesquioxane derivative having a radical polymerizable functional group, represented by formula (1), (2), or (3). In formulae (1)-(3), R1 is a group independently selected from among a C1-45 alkyl, a C4-8 cycloalkyl, a C6-14 aryl, and a C7-24 arylalkyl, R2 and R3 are groups independently selected from among a C1-10 alkyl, a cyclopentyl, a cyclohexyl, and a phenyl, X is independently a hydrogen or a monovalent organic group, and at least one in X is a radical polymerizable functional group represented by formula (4).
Inventors:
SUWA KAZUYA (JP)
IKENO HIRONORI (JP)
OOBA TOMOYUKI (JP)
IKENO HIRONORI (JP)
OOBA TOMOYUKI (JP)
Application Number:
PCT/JP2018/000194
Publication Date:
July 19, 2018
Filing Date:
January 09, 2018
Export Citation:
Assignee:
JNC CORP (JP)
JNC PETROCHEMICAL CORP (JP)
JNC PETROCHEMICAL CORP (JP)
International Classes:
C07F7/10; C08F230/08; C08G77/20; C08G77/38
Domestic Patent References:
| WO2004024741A1 | 2004-03-25 | |||
| WO2003024870A1 | 2003-03-27 | |||
| WO2010024119A1 | 2010-03-04 |
Foreign References:
| JP2004331647A | 2004-11-25 | |||
| JP2004004612A | 2004-01-08 | |||
| CN104672273A | 2015-06-03 | |||
| CN104693231A | 2015-06-10 |
Attorney, Agent or Firm:
SANUKI, Shinichi et al. (JP)
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