SILSESQUIOXANE RESIN, AND ANTI-REFLECTIVE COMPOSITION COMPRISING SAME AND HAVING ANTI-FINGERPRINT PROPERTIES

Title:

SILSESQUIOXANE RESIN, AND ANTI-REFLECTIVE COMPOSITION COMPRISING SAME AND HAVING ANTI-FINGERPRINT PROPERTIES

Document Type and Number:

WIPO Patent Application WO/2022/145754

Kind Code:

A1

Abstract:

The present invention relates to a composition comprising silsesquioxane resin containing a particular chemical structural unit and a fluoroalkyl group, and cured material obtained by curing the composition. More specifically, the present invention relates to a composition that can produce cured material having excellent anti-reflective and water-repellent properties, and to cured material obtained by curing the composition.

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Inventors:

LIM HAE RYANG (KR)
NAM DONG JIN (KR)
CHOI SEUNG SOCK (KR)
YOO HYUN SEOK (KR)
KIM YOUNG MO (KR)
OH SEONG YEON (KR)
PARK HAN BIN (KR)

Application Number:

PCT/KR2021/017975

Publication Date:

July 07, 2022

Filing Date:

December 01, 2021

Export Citation:

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Assignee:

DONGJIN SEMICHEM CO LTD (KR)

International Classes:

C08G77/24; C09D183/08

Foreign References:

KR20190056307A	2019-05-24
JP2019069586A	2019-05-09
KR20150105603A	2015-09-17
KR101996262B1	2019-10-01
US20120252920A1	2012-10-04

Attorney, Agent or Firm:

IPCJ PATENT & LAW FIRM (KR)

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