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Title:
SILYL PHOSPHINE COMPOUND, METHOD FOR PRODUCING SILYL PHOSPHINE COMPOUND AND METHOD FOR FORMING InP QUANTUM DOT
Document Type and Number:
WIPO Patent Application WO/2019/188680
Kind Code:
A1
Abstract:
The silyl phosphine compound according to the present invention is represented by formula (1) and has an arsenic content of 1 ppm or less. The method according to the present invention for producing a silyl phosphine compound comprises: mixing a basic compound, a silylating agent and phosphine to give a solution containing a silyl phosphine compound; removing the solvent from the solution to give a liquid concentrate containing the silyl phosphine compound; and then distilling the liquid concentrate, wherein the arsenic content of the phosphine is regulated to 1 ppm by volume or less in terms of arsine. In the method according to the present invention for forming an InP quantum dot, a silyl phosphine compound that is represented by formula (1) (wherein R is as defined in the description) and has an arsenic content of 1 ppm by mass or less is used as a phosphorus source.

Inventors:
TAKUBO, Yosuke (9-11-1, Kameido, Koto-k, Tokyo 15, 〒1368515, JP)
TAMURA, Ken (9-11-1, Kameido, Koto-k, Tokyo 15, 〒1368515, JP)
NAKATSUI, Kazuhiro (9-11-1, Kameido, Koto-k, Tokyo 15, 〒1368515, JP)
Application Number:
JP2019/011760
Publication Date:
October 03, 2019
Filing Date:
March 20, 2019
Export Citation:
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Assignee:
NIPPON CHEMICAL INDUSTRIAL CO.,LTD. (9-11-1, Kameido Koto-k, Tokyo 15, 〒1368515, JP)
International Classes:
C07F19/00; C01B25/08; H01L29/06; C07F7/08; C07F9/50
Domestic Patent References:
WO2017074897A12017-05-04
Foreign References:
JP2017538662A2017-12-28
DD274626A11989-12-27
Other References:
UHLIG, W. ET AL.: "Eine neue Methode zur Darstellung von Organosilylphosphinen", Z. ANORG. ALLG. CHEM., vol. 576, 1989, pages 281 - 283, XP009503051, doi:10.1002/zaac.19895760132
Attorney, Agent or Firm:
SHOWA INTERNATIONAL PATENT FIRM (NIKKEN AKASAKA BLDG, 7F. 5-7, Akasaka 2-chome, Minato-k, Tokyo 52, 〒1070052, JP)
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