Title:
SINTERED BODY SPUTTERING TARGET
Document Type and Number:
WIPO Patent Application WO/2012/086388
Kind Code:
A1
Abstract:
Disclosed is a sintered body sputtering target containing Co and Cr as a metal component and comprising oxides dispersed in the substrate of said metal component. The structure of said sputtering target has, in the metal substrate, a region (A) in which Co oxides are dispersed in Co, and a region (D) containing Cr oxides in the periphery of said region (A). In the disclosed method of producing the aforementioned sintered body sputtering target, the aforementioned structure is obtained by pressure sintering a mixed powder obtained by mixing a Co powder, a Cr powder, and a powder obtained by crushing a sintered body in which Co oxides are dispersed in Co. By this means, a sputtering target is disclosed which has the required amount of Co oxides remaining, has low particle generation during sputtering, and has sufficient sintered density.
Inventors:
SATO ATSUSHI (JP)
NAKAMURA YUICHIRO (JP)
NAKAMURA YUICHIRO (JP)
Application Number:
PCT/JP2011/077897
Publication Date:
June 28, 2012
Filing Date:
December 02, 2011
Export Citation:
Assignee:
JX NIPPON MINING & METALS CORP (JP)
SATO ATSUSHI (JP)
NAKAMURA YUICHIRO (JP)
SATO ATSUSHI (JP)
NAKAMURA YUICHIRO (JP)
International Classes:
C23C14/34; C22C1/05; C22C19/07; C22C32/00; G11B5/851
Domestic Patent References:
| WO2010074171A1 | 2010-07-01 |
Foreign References:
| JP2010255088A | 2010-11-11 | |||
| JP2010272177A | 2010-12-02 | |||
| JP2009238357A | 2009-10-15 | |||
| JP2009170052A | 2009-07-30 | |||
| JP2011248961A | 2011-12-08 |
Attorney, Agent or Firm:
OGOSHI ISAMU (JP)
Isamu Ogoshi (JP)
Isamu Ogoshi (JP)
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