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Title:
SINTERING PROCESS OF METAL OXIDE BASED FORMULATIONS
Document Type and Number:
WIPO Patent Application WO/2012/140684
Kind Code:
A1
Abstract:
The present invention relates to a process of sintering of metal oxide films, from formulations based on particles of metal oxides, characterized in that it comprises the following steps, in succession: a) adding to the formulation particles or molecules of a compound absorbing the electromagnetic radiation in the regions of visible and/or infrared spectrum that, in consequence of the absorption of the radiation, generates heat; b) mixing until a homogeneous dispersion of the absorbing compound in the formulation is obtained; c) deposition of the formulation in the form of a film on a substrate; d) irradiation of said film with an electromagnetic radiation in the visible and/or infrared regions of the spectrum, to obtain the desired sintering of said particles of metal oxides through the heating produced by said absorbing compound. The invention also relates to a process for the production of photoelectrochemical cells in which the steps of manufacture of the electrode based on metal oxides are carried out according to said sintering process of formulations based on metal oxides and the steps of manufacture of the counter electrode can be performed by a similar procedure.

Inventors:
DI CARLO ALDO (IT)
MINCUZZI GIROLAMO (IT)
BROWN THOMAS MEREDITH (IT)
REALE ANDREA (IT)
Application Number:
PCT/IT2012/000104
Publication Date:
October 18, 2012
Filing Date:
April 12, 2012
Export Citation:
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Assignee:
DYEPOWER (IT)
DI CARLO ALDO (IT)
MINCUZZI GIROLAMO (IT)
BROWN THOMAS MEREDITH (IT)
REALE ANDREA (IT)
International Classes:
H01L51/00; H01G9/20
Domestic Patent References:
WO2010064213A12010-06-10
WO1991016719A21991-10-31
WO2007015250A22007-02-08
WO2002095805A22002-11-28
WO2005039814A22005-05-06
Foreign References:
US20070120178A12007-05-31
US4927721A1990-05-22
US5350644A1994-09-27
US5525440A1996-06-11
US20070120178A12007-05-31
Other References:
GIROLAMO MINCUZZI ET AL: "Efficient sintering of nanocrystalline titanium dioxide films for dye solar cells via raster scanning laser", APPLIED PHYSICS LETTERS, vol. 95, no. 10, 1 January 2009 (2009-01-01), pages 103312, XP055008602, ISSN: 0003-6951, DOI: 10.1063/1.3222915
S. ITO ET AL.: "Fabrication of ScreenPrinting Pastes From Ti02 Powders for Dye-Sensitised Solar Cells", PROGRESS IN PHOTOVOLTAICS: RESEARCH AND APPLICATIONS, vol. 15, 2007, pages 603 - 612
L. VESCE; R. RICCITELLI: "Processing and characterization of a Ti02 paste based on small particle size powders for dye-sensitized solar cell semitransparent photo-electrodes", PROG. PHOTOVOLT: RES APP., 2011, pages 1166
L. VESCE; R. RICCITELLI; G. SOSCIA; T.M. BROWN; A. DI CARLO; A. ROYAL: "Optimization of Nanostructured titania photoanodes for dye-sensitized solar cells: Study and Experimentation of TiC14 treatment", JOURNAL OF NON-CRYSTALLINE SOLIDS, vol. 356, 2010, pages 1958 - 1961
M.K. NAZEERUDDIN; P. PCHY; T. RENOUARD; S.M. ZAKEERUDDIN; R. HUMPHRY-BAKER; P.COMTE; P. LISKA; L. CEVEY; E. COSTA; V. SHKLOVER, JACS, vol. 123, 2001, pages 1613
S. ITO; P. CHEN; P. COMTE; M.K. NAZEERUDDIN; P. LISKA; P. PECHY; M. GRAETZEL, PROG. PHOTOVOLT: RES APPL., vol. 15, 2007, pages 603 - 612
S. UCHIDA ET AL.: "Preparation of Nanocrystalline Ti02 Electrode for Dye-Sensitised Solar Cells by 28GHz Microwave Irradiation", SOLAR ENERGY MATERIALS & SOLAR CELLS, vol. 81, 2004, pages 135 - 139, XP004482769, DOI: doi:10.1016/j.solmat.2003.08.020
KIM ET AL.: "Laser-sintered mesoporous Ti02 electrodes for dye-sensitized solar cells", APPL. PHYS., vol. A 83, 2006, pages 73 - 76, XP019337201, DOI: doi:10.1007/s00339-005-3449-0
MINCUZZI ET AL.: "Efficient sintering of nanocrystalline titanium dioxide films for DSC via raster scanning lasers", APPL PHYS. LETT, vol. 95, 2009, pages 103312
Y. WU; L.L. HENCH, MATERIALS SCIENCE AND ENGINEERING A, vol. 454, 2007, pages 148
P.K. VENUVINOD; W. BUT: "Rapid Prototyping: Laser-based and Other Technologies", 2004, KLUWER ACADEMIC
S. ITO ET AL., PROG. PHOTOVOLT: RES APPL., vol. 14, 2006, pages 589 - 601
S. ITO ET AL., PROGRESS IN PHOTOVOLTAICS: RESEARCH AND APPLICATIONS, vol. 15, 2007, pages 603
KIJITORI Y; M IKEGAMI; T MIYASAKA, CHEMISTRY LETTERS, vol. 36, 2007, pages 190
S. ITO; P. LISKA; P. COMTE; R. CHARVET; P. PECHY; U. BACH; L. SCHMIDT-MENDE; SM ZAKEERUDDIN; A. KAY; MK NAZEERUDDIN, CHEM.COMMUN., 2005, pages 4351
S. ITO; P. CHEN; P. COMTE; MK NAZEERUDDIN; P. LISKA; P. PECHY; M. GRATZET, PROG. PHOTOVOLT: RES APPL., vol. 15, 2007, pages 603
0. QUICK; DC HANNA: "Principles of Lasers", 1998, SPRINGER
ITO ET AL., PROG. PHOTOVOLT: RES APPL., vol. 14, 2006, pages 589 - 601
Attorney, Agent or Firm:
SANTI, Filippo (Via Piemonte 26, Roma, IT)
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Claims:
CLAIMS

1) A process of sintering of metal oxide films, from formulations based on particles of metal oxides, characterized in that it comprises the following steps, in succession:

a) adding to the formulation particles or molecules of a compound absorbing the electromagnetic radiation in the regions of visible and/or infrared spectrum that, in consequence of the absorption of the radiation, generates heat;

b) mixing until a homogeneous dispersion of the absorbing compound in the formulation is obtained;

c) deposition of the formulation in the form of a film on a substrate; d) irradiation of said film with an electromagnetic radiation in the visible and/or infrared regions of the spectrum, to obtain the desired sintering of said particles of metal oxides through the heating produced by said absorbing compound.

2) A process of sintering according to claim 1 , characterized in that said electromagnetic radiation has a wavelength greater than 400nm.

3) A process of sintering according to claim 1 or 2, characterized in that said electromagnetic radiation has a power output at least equal to 1W/cm2.

4) A process of sintering according to any one of the preceding claims, characterized in that said formulations based on particles of metal oxides are colloidal dispersions of these metal oxides.

5) A process of sintering according to any one of the preceding claims, characterized in that said step of irradiation is made with a scanning Vis/IR laser system.

6) A process of sintering according to any one of the preceding claims, characterized in that said step of irradiation is obtained with an electromagnetic radiation with a wavelength entirely or predominantly between 500 and 1200nm.

7) A process of sintering according to any of the preceding claims, characterized in that the solid content of said molecules or particles of absorbing compound in the formulation based on metal oxides is between 0.1% and 60% by weight.

8) A process of sintering according to claim 7, characterized in that the solid content of said molecules or particles of absorbing compound in the formulation based on metal oxides is between 1%-20% by weight. 9) A process of sintering according to any of the preceding claims, characterized in that said molecules or particles of absorbing compound have extinction coefficients greater than 1 l/g cm at the wavelengths of the radiation used.

10) A process of sintering according to any of the preceding claims, characterized in that said molecules or particles of absorbing compound have extinction coefficients greater than 0 l/g cm at the wavelengths of the radiation used.

11) A process of sintering according to any of the preceding claims, characterized in that said molecules or particles of absorbing compound have decomposition temperatures lower or equal than the optimum sintering temperature of said metal oxides.

12) Process for the production of photoelectrochemical cells, comprising a step of realization of an electrode based on metal oxides and a phase of construction of a counter electrode, characterized in that said step of realization of the electrode of metal oxides is realized according to the process of sintering of metal oxide films, starting from formulations based on particles of metal oxides according to claims 1-11.

13) Process for the production of photoelectrochemical cells according to claim 12, characterized in that said step of realization of the counter electrode is obtained according to the following sub-steps, in succession:

- addition to a formulation of precursors of the material of the counter electrode of molecules or particles of a compound absorbing the electromagnetic radiation in the visible and infrared regions of the spectrum which, as a result of absorption of the radiation, generates heat;

- mixing until a homogeneous dispersion of the absorbing compound in the formulation is obtained;

- deposition of the formulation in the form of films on a substrate; - irradiation of said film with an electromagnetic radiation in the visible and/or infrared regions of the spectrum, to obtain the cooking of said film and the processing of such precursors of the material of the counter electrode through the heating produced by said absorbing compound.

14) Process for the production of photoelectrochemical cells according to claim 13, characterized in that said molecules or particles of absorbing compound added to the formulation of precursors of the material of the counter electrode absorb at the same wavelengths of the molecules or particles of absorbing compound added to the formulation based on particles of metal oxides used for the realization of the metal oxide electrode.

15) Process for the production of photoelectrochemical cells according to claim 14, characterized in that said step of irradiation of the formulation based on metal oxides used for the realization of the metal oxide electrode and said step of irradiation of the formulation of precursors used for the realization of the counter electrode take place simultaneously.

16) Process for the production of photoelectrochemical cells according to claim 14 or 15, characterized in that said step of irradiation of the formulation based on metal oxides used for the realization of the metal oxide electrode and said step of irradiation of the formulation of precursors used for the realization of the counter electrode are obtained with the same source of radiation.

Description:
SINTERING PROCESS OF METAL OXIDE BASED FORMULATIONS

The present invention relates to a process of sintering of formulations based on metal oxides, as well as a process for the production of photoelectrochemical cells comprising said process of sintering of formulations based on metal oxides.

The invention relates to the realization of sintered active layers of formulations based on metal oxides such as SnO 2 , ZnO, Nb 2 0 5 , Ce0 2 , SrTi0 3l Ti0 2 and more particularly, according to a preferred but not limiting embodiment of the present invention, to an electrochemical cell and its manufacturing process.

In particular, the present invention relates to the sintering of the layer of metal oxide of the cell, by using laser radiation with a wavelength in the visible and infrared region of the electromagnetic spectrum, assisted by specific pigment molecules that absorb said laser radiation converting it to heat. These pigments are to be included in the formulation of the paste of metal oxide prior to the procedure of deposition and sintering necessary for the formation of the layer of metal oxide.

Even more particularly, the invention is proposed as an application in the manufacture of photoelectrochemical cells also called, with English terminology, Dye Sensitized Solar Cells (DSSC), or more simply DSC (DSC).

DSSC are photovoltaic cells having a multi-layer structure deposited on a substrate or, more frequently, sandwiched between two conductive substrates/Typically, said substrates are made of transparent material (preferably glass, but also plastic such as PET or PEN) and are coated, on the side facing the interior of the structure, with an electrically conductive material which is also transparent (more generally a transparent conductive oxide, preferably a tin oxide doped with fluorine or an alloy of tin oxide and indium oxide, respectively said FTO and ITO). An alternative consists in the use for only one of the two electrodes, of a metal foil (eg titanium, steel, aluminum suitably treated) as the substrate.

Between the two substrates one or more photoelectrochemical cells are arranged, electrically connected to each other in series and/or in parallel. Each cell consists of a photoelectrode (the anode), placed on the conductive coating of one of the two substrates, a counter electrode (the cathode), placed on the conductive coating of the other substrate, and an electrolyte interposed between said photoelectrode and said counterelectrode. In particular, the photoelectrode is usually made of a porous semiconductor material with wide band gap, such as titanium dioxide Ti0 2 or zinc oxide, which supports the active material, consisting of a pigment capable of transferring electrons in the semiconductor as a consequence of the absorption of a photon. The counter electrode is generally constituted by a thin layer of platinum, while the electrolytic solution generally contains a redox couple I7I 3 " .

Photoelectrochemical cells of this type are disclosed for example in U.S. Patent No. 4,927,721 while the materials used in this type of cells are disclosed for example in U.S. Patent No.5, 350, 644.

The layer of porous semiconductor material can be deposited in the form of liquid or colloidal suspension through several techniques that include, but are not limited to, screen printing, spray coating, slot-dye coating, gravure coating, flexographic printing, blade coating.

A typical suspension or colloidal paste of nanocrystalline Ti0 2 consists of water and/or organic solvents (eg ethanol) and/or substances with the function of carrier such as terpineol, nanoparticles (5 to 500nm in diameter) of metal oxide, typically T1O2, a binder viscosity modifier, such as polyethylene glycol (PEG), ethyl cellulose or polyethylene oxide and/or other substances having the function of plasticizers. The formulations for the preparation of this type of colloidal pastes are disclosed in W09116719 and WO2007/015250 as well as in "Fabrication of Screen- Printing Pastes From T1O2 Powders for Dye-Sensitised Solar Cells", S. Ito, et al., Progress in Photovoltaics: Research and Applications, vol. 15, 2007, p. 603-612.

As it is well known, according to the present state of the art sintering of the active layer of metal oxide is obtained by heating the whole substrate on which the above said paste of metal oxide was previously filed. The heating process is usually performed using ovens or hot plates. This process has the dual purpose of ensuring a good electromechanical bond between the particles while maintaining the porosity of the material and its surface area large enough. As disclosed in patent N. US5525440, the sintering takes place at relatively high temperatures, which for example are usually around 450°C - 550°C for the Ti0 2.

In general, in the following description, by the term optimum sintering temperature of the metal oxides is meant the temperature at which it is necessary to bring a thin layer of a paste of said metal oxides so that, used for the manufacture of such photoelectrochemical cells, they allow to optimize the performance of the cells. For the titanium dioxide (ΤΊΟ2) in particular, and for applications of the same in photoelectrochemical cells with photovoltaic properties (which constitute a particularly preferred embodiment of the present invention and to which specific reference will be made in the following description), reference is made in particular to optimize the efficiency of converting solar energy into electricity. A vast literature shows that this temperature varies between 450°C and 550°C depending on the particular formulation of the paste of metal oxide and the thickness of the active layer produced from it. [a) L Vesce, R. Riccitelli, "Processing and characterization of a T1O2 paste based on small particle size powders for dye-sensitized solar cell semi- transparent photo-electrodes" Prog. Photovolt: Res App. 2011 , DOI: 10.1002/pip.1166; b) L. Vesce, R. Riccitelli, G. Soscia, T.M. Brown, A. Di Carlo, A. Royal, Optimization of Nanostructured titania photoanodes for dye-sensitized solar cells: Study and Experimentation of TiCI 4 treatment" Journal of Non-Crystalline Solids 2010, 356: 1958-1961 ; c) M.K. Nazeeruddin, P. Pchy, T. Renouard, S.M. Zakeeruddin, R. Humphry- Baker, P.Comte, P. Liska, L. Cevey, E. Costa, V. Shklover, L. Sloppily, G.B. Deacon, C.A. Bignozzi, and M. Graetzel, JACS, 123, 1613, 2001 ; d) S. Ito, P. Chen, P. Comte, M.K. Nazeeruddin, P. Liska, P. Pechy, and M. Graetzel, Prog. Photovolt: Res Appi, 15, 603-612, 2007).

In the literature alternative processs of sintering have also been proposed, which make use of electromagnetic radiation at various frequencies, be it emitted by laser or by other devices. Compared to heating in the oven, these processes have the advantage of producing in the film a localized and selective heating, with an automated, rapid and accurate control of the area to be sintered.

This allows to select, with a high resolution, which parts are to be sintered (while the oven heats the whole substrate) with consequent obvious advantages in the construction of DSC modules, such as those with the configuration called W (where there is an alternation of T1O2 areas with other catalyst areas).

In addition, the sintering of the film in object by irradiation with electromagnetic radiation allows the integration of photoelectrochemical cells DSSC with other materials or devices which can not be processed at high sintering temperatures. In particular, in "Preparation of Nanocrystalline TiO 2 Electrode for Dye-Sensitised Solar Cells by 28GHz Microwave Irradiation", S. Uchida et al., Solar Energy Materials & Solar Cells 81 (2004), pages 135-139, it is disclosed a process for the rapid sintering of nanocrystalline ΤΊΟ2 on a glass electrode (made conductive by a layer of transparent oxide) for the construction of DSSC, through the use of 28GHz microwave radiation. Patent US2007120178 discloses a process of sintering which provides for the use of laser radiation with a wavelength of 360nm, hence on the ultraviolet (UV) part of the spectrum. In "Laser-sintered mesoporous Ti0 2 electrodes for dye-sensitized solar cells", Kim et al., Appl. Phys. A 83, 73- 76 (2006) and "Efficient sintering of nanocrystalline titanium dioxide films for DSC via raster scanning lasers", Mincuzzi et al. Appl Phys. Lett 95, 103312 (2009), it is also disclosed how to sinter a layer of TiO 2 using a pulsed UV laser (with a wavelength of 355 nm).

U.S. Patent No. US2007120178 discloses the localized heating of cells of metal oxides by means of irradiation with the use of both microwave radiation and generic laser radiation.

It shall be noted that the sintering process by means of laser radiation is obtained by heating locally the nanocrystalline layer of Ti0 2 which is irradiated. The heating and, hence, uniform sintering of a wide area is obtained by scanning with the laser beam the whole selected surface. The complete sintering by means of laser scanning of layers of TiO 2 was used in the manufacture of ceramics of TiO 2 and for the production of functional objects based on Ti0 2 [Y. Wu, J. Du, K.L. Choy, and L.L. Hench, Materials Science and Engineering A 2007, 454, p148; P.K. Venuvinod and W. But, in Rapid Prototyping: Laser-based and Other Technologies, Kluwer Academic, Boston USA, 2004]. In general, and for good reason, it can be argued that the use of laser scanning has become a tool more and more used in industry. In particular this is true for performing the so-called rapid prototyping, generic print jobs, patterning of electro-active polymers, manufacturing of electronic devices (P. Cain and H. Sirringhaus WO02095805, WO2005/039814 and patents cited in therein) and special workings of traditional and thin film semi conductor solar cells. In fact, these systems allow the execution of highly automated production processes with high precision and selectivity resulting also scalable in space and cost effective.

To date, however, the laser systems used for the sintering of the layer of Ti0 2 in DSSC cells are only those with emission in the near UV (<400nm), since only at these wavelengths semiconductor oxides with broadband as Ti0 2 show a significant optical absorption, as the photon energy appears to be greater than the band gap.

The lasers that emit in the near UV region, however, have the drawback to have an efficiency that is not particularly high, especially if compared with that of the lasers in the visible or infrared. This of course has a negative impact on the production costs of the cell, both in terms of energy and financial.

Furthermore, the UV radiation is absorbed also from the substrate and the transparent conductive electrodes underlying the layer of Ti0 2 . The UV sintering process is therefore a process with limited range, because the user must find the right parameters for which the laser is absorbed by the layer of metal oxide but not from the electrode or from the substrate, the degradation of which would seriously undermine the efficiency of the solar cell (in particular for thin layers of Ti0 2 ). This problem is even more important when one wants to carry out the process not on the glass but on flexible plastic substrates.

A further limitation of the known solutions, also, consists in the fact that the UV laser does not allow the sintering of the layer of Ti0 2 by irradiation through the substrate of glass or plastic materials since the latter are opaque to UV radiation.

In the light of the above, it appears evident the need of being able to have a process of sintering of the nanocrystalline layer of semiconductor oxide such as Ti0 2 with high efficiency, which allows to optimize the financial and energy costs of the production of solar cells.

In addition, such a procedure should make it possible to obtain the sintering of the layer of Ti0 2 without the substrate and the transparent conductive electrodes underlying the layer of Ti0 2 being adversely affected as a result of the chosen sintering treatment.

In this context it is included the solution according to the present invention, which aims to provide a process of sintering of the layer of the porous metal oxide of the photoelectrochemical cell through the use of laser systems which emit in the visible and infrared region of the electromagnetic spectrum. !

These and other results are obtained, according to the present invention, by inserting particular and specific pigment molecules in the formulation of the paste of metal oxide prior to the procedure of deposition and sintering. These pigments should be characterized by a high absorption of laser radiation in the visible and infrared regions of the electromagnetic spectrum, depending on which laser is chosen for sintering. Following the deposition of this active layer, it is irradiated with a scanning laser system. As already said, the pigment molecules inserted in the paste of T1O2 are such to absorb the laser beam and, by acting as mediators, transferring heat to nanoparticles of Ti0 2 finally sintering the layer of material.

The innovative aspect of the present invention lies in allowing the localized sintering of the material through the use of laser systems in the visible and IR, which otherwise could not be used effectively, since the Ti0 2 absorbs significantly only for wavelengths in the region of the near UV.

Furthermore, the lasers that emit in the visible and near infrared

(called Vis-IR laser) constitute a simpler, more mature and efficient technology, capable of capturing, thanks to a wide variety of applications, a large segment of the market. All this means that such laser systems require a lower financial commitment in terms of both capital and use.

Again, the opening to the use of Vis-IR laser has the enormous advantage of the possibility of obtaining a sintering also effective for plastic substrates and flexible cells, making it also possible the sintering through the substrate, with a consequent obvious advantages in terms of process.

The purpose of the present invention is therefore to provide a process of sintering that allows to overcome the limits of the solutions of the prior art and to obtain the previously described technical results.

Further object of the invention is that said process can be manufactured with substantially limited costs.

Not least, with the present invention it is provided a process which is substantially simple, safe and reliable.

It is therefore a first object of the present invention a process of sintering of metal oxide films, from formulations based on particles of metal oxides, characterized in that it comprises the following steps, in succession:

a) adding to the formulation particles or molecules of a compound absorbing the electromagnetic radiation in the regions of visible and/or infrared spectrum that, in consequence of the absorption of the radiation, generates heat;

b) mixing until a homogeneous dispersion of the absorbing compound in the formulation is obtained;

c) deposition of the formulation in the form of a film on a substrate; d) irradiation of said film with an electromagnetic radiation in the visible and/or infrared regions of the spectrum, to obtain the desired sintering of said particles of metal oxides through the heating produced by said absorbing compound.

In particular, according to the invention, said electromagnetic radiation has a wavelength greater than 400nm and a power at least equal to 1W/cm 2 .

Preferably, according to the invention, said formulations based on particles of metal oxides are colloidal dispersions of these metal oxides.

In addition, according to the present invention, said step of irradiation is made with a scanning Vis/I R laser system, preferably with an electromagnetic radiation with a wavelength entirely or predominantly between 500 and 1200nm.

In particular, always according to the present invention, the solid content of said molecules or particles of absorbing compound in the formulation based on metal oxides is between 0.1% and 60% by weight, preferably between 1% and 20% by weight, and said molecules or particles have extinction coefficients greater than 1 l/g cm, preferably greater than 10 l/g cm, at the wavelengths of the radiation used.

Preferably, according to the invention, said particles of absorbing compound have decomposition temperatures lower or equal than the optimum sintering temperature of said metal oxides.

It is further a second specific object of the present invention a process for the production of photoelectrochemical cells, comprising a step of realization of an electrode based on metal oxides and a phase of construction of a counter electrode wherein said step of realization of the electrode of metal oxides is realized according to the previously said process of sintering of metal oxide films, starting from formulations based on particles of metal oxides.

According to the invention, said process for the production of photoelectrochemical cells can further provide that the realization of the counter electrode is obtained according to the following sub-steps, in succession:

- addition to a formulation of precursors of the material of the counter electrode of molecules or particles of a compound absorbing the electromagnetic radiation in the visible and infrared regions of the spectrum which, as a result of absorption of the radiation, generates heat;

- mixing until a homogeneous dispersion of the absorbing compound in the formulation is obtained;

- deposition of the formulation in the form of films on a substrate;

- irradiation of said film with an electromagnetic radiation in the visible and/or infrared regions of the spectrum, to obtain the cooking of said film and the processing of such precursors of the material of the counter electrode through the heating produced by said absorbing compound.

Preferably, according to the invention, the molecules or particles of absorbing compound added to the formulation of precursors of the material of the counter electrode absorb at the same wavelengths of the molecules or particles of absorbing compound added to the formulation based on particles of metal oxides used for the realization of the metal oxide electrode.

More preferably, according to the present invention, said step of irradiation of the formulation based on metal oxides used for the realization of the metal oxide electrode and said step of irradiation of the formulation of precursors used for the realization of the counter electrode take place simultaneously and/or may be obtained with the same source of radiation.

It is evident the efficiency of the process of the present invention, which allows the use of industrial laser scanning systems (the vast majority in the IR) already well developed and automated for other industries. In addition, the industrial laser scanning systems are more energy efficient, with the consequence of reducing the cost of manufacture compared to the UV laser.

The fact that the sintering is obtained with IR or visible laser systems allows potentially effective sintering of films also on flexible plastic substrates, thus allowing the manufacture of efficient DSSC electrochemical cells on plastic.

Finally, the laser process has the advantage of being local, rapid, selective and scalable both on large surfaces and with different shapes.

The invention will be disclosed herein below for illustrative but not limitative purposes, with particular reference to some illustrative examples.

The embodiments of the present invention relate to processes by which films with high surface area of nanocrystalline semiconductor oxide, including Ti0 2 , can be sintered using visible and infrared laser. An objective of the present invention is to provide a new technique for the sintering of nanocrystalline semiconductor oxides, preferably after being deposited on a substrate from a suspension, a paste or solution which include pigments that absorb strongly at the wavelength of the laser. The invention also provides a process for the preparation of a formulation of a paste of Ti0 2 by mixing in the composition of the paste a pigment that absorbs laser radiation in the visible or infrared region. Further embodiments of the present invention relate to processes through which solutions or pastes of the precursors of the counter electrode (such as those based on Pt) may be cooked using laser systems in the visible or infrared in a similar way, which is evident to a person skilled in the art.

The layers of metal oxide (for example Ti0 2 ) for DSC are deposited on the conductive layers (usually glass or flexible sheets covered with a transparent conductive oxide). Typically, the layer of Ti0 2 is deposited in the form of a paste by means of molding techniques such as screen printing, slot dye coating, spray coating. In one embodiment of the present invention, pigment molecules are added to the formulation of the paste or suspension of metal oxide nanoparticles and mixed and dispersed herewithin, before the paste or suspension is deposited to form the layer. These pigments are chosen from those which strongly absorb in the visible and infrared region of the electromagnetic spectrum so that they have a strong absorption at the wavelength of the laser that is used to obtain the heating and sintering of said layer.

In one embodiment of this invention, in order to heat through infrared laser systems (with wavelengths of 830nm or 1064nm for example) it is selected, as an absorbing pigment dispersed in the paste of Ti0 2l a pigment that absorbs strongly between 800nm and 1200nm. The solid content of the pigment in the formulation of the paste will depend among other things by the extinction coefficient of the pigments at the laser wavelength, but will preferably be between 0.1 % and 60%, more preferably between 1% and 20%. To the formulation of the paste of metal oxide in suspension pigments are added with extinction coefficients greater than 1 l/g cm and preferably greater than 10 l/g cm at the wavelengths of the laser systems. For laser systems in the visible region (eg 532 nm), which may be preferable if both the substrate (eg glass or transparent plastic materials) and the transparent conductive oxides are transparent to the visible region of the electromagnetic spectrum, other pigments are selected that strongly absorb at those wavelengths.

For the sintering process laser systems can be used with power greater than 0.1 W, preferably greater than 1W. The spot size can vary between tens of μιη 2 and 100 mm 2 , preferably is greater than 0.1 mm 2 . The laser spot is scanned alternately on the sample by mounting the sample to be sintered on planar translation axes, called xy axes, or preferably, the laser beam will be scanned using rotating mirrors (known as galvo-mirrors) to increase the speed of manufacture. A further degree of freedom is the z-axis by which it is possible to adjust the distance (called defocusing distance) between the film of T1O2 and the focal point of the laser beam and to vary the size of the spot. By controlling the scanning in the xy plane of the beam on the layer of metal oxide it is possible to scan large areas and therefore large surfaces of the layer of metal oxide can be sintered.

The molecules of pigment dispersed in the suspension of T1O2 absorb the laser radiation and transfer the energy to the surrounding matrix of Ti0 2 (Ti0 2 crystals absorb significantly only in the UV region of the electromagnetic spectrum so that the heat is transferred from the pigment to the absorbent T1O2) leading to sintering of the layer of metal oxide as required for the manufacture of efficient solar cells. The pigment molecules identified for the present invention preferably have (but are not limited to) discoloration and decomposition temperatures (for the very short time in which they are optically and thermally excited by the scanning laser beam) that are not much lower than the optimal local sintering temperatures of the layer of T1O2, greater than 150°C (preferably greater than 350°C). Preferably, but not limited to, the pigments will decompose at such temperatures of sintering. The process is therefore self-limiting due to the fact that when the absorption of laser radiation by the absorbing pigment becomes too high, the molecules of pigment discolor and/or decompose and the laser beam will no more transfer its energy to the material. The decomposition of the molecules of the pigment is a further advantage, since the layer of T1O2 needs to be porous to increase its active and sensitive to visible light surface area, as well as its optical density.

Subsequent to the sintering of the layer of Ti0 2) the making of the DSC can be carried out as disclosed in the literature (see for example U.S. Patents No. 5525440 and 5350644 or S. Ito et al. Prog. Photovolt: Res Appl. 2006; 14:589-601).

The manufacturing process of the present invention is particularly suitable for, but not limited to, the production and sintering of nanocrystalline mesoporous films of layers of metal oxide such as those used in the DSC. Other applications for devices based on laser sintered T1O2 include photocatalytic, electrochromic, gas detection, photocatalytic water splitting, hydrogen storage and hybrid photovoltaic devices. The same procedure can be applied to other nanocrystalline oxides with a large band gap.

In one embodiment of the present invention, pigment molecules, which will absorb the laser radiation in the subsequent phases, are added to the formulation of paste or suspension based on nanoparticles of metal oxide and mixed and dispersed therein, preferably, but not necessarily, immediately before, or immediately after, or simultaneously with the mixing of organic binders or plasticizers. For example, ethyl cellulose can be dissolved in ethanol as disclosed by S. Ito et al., Progress in Photovoltaics: Research and Applications; vol. 15, 2007, p. 603. The pigment suggested according to the present invention is preferably added at this stage. In another embodiment of the invention binder free pastes may be formulated [Kijitori Y, M Ikegami, T Miyasaka - Chemistry Letters, 2007, Vol 36 (2007), p.190]. In this case, since there is no organic binders, it appears that the only solid organic compounds present are the laser radiation absorbing pigments.

In its simplest form, the DSC comprises only one layer of metal oxide (eg TiO 2 ). A DSC with two layers, instead, comprises a layer of mesoporous T1O2 with nanoparticles having a diameter of between 5nm and 50nm and a thickness of 1μιη^<25μΓη and a layer having the function of the back-light diffuser with particles of T1O2 with diameter of a few hundred nm and a thickness of few microns [S. Ito et al. Progress in Photovoltaics: Research and Applications, vol. 15, 2007, p. 603]. For this architecture, the pigment can be added to one of the two layers only or to both. Preferably, but not limited to, the pigment is added to the main mesoporous layer. In other architectures, the SDC may include an additional layer of thin compact Ti0 2 with a thickness typically <1μι , which is sometimes added between the electrode and the main layer of mesoporous Ti0 2 [S. Ito, P. Liska, P. Comte, R. Charvet, P. Pechy, ύ. Bach, L. Schmidt-Mende, SM Zakeeruddin, A. Kay, MK Nazeeruddin, and M. Gratzel, Chem.Commun., 2005, 4351].

In one embodiment of this invention, for the sintering of the layer of metal oxide using an infrared laser (with wavelengths which for example may be equal to 830 nm or about 1060 nm) it is chosen as an absorbing pigment dispersed in the ΤΊΟ2 paste the compound IRA 980BT of Exciton, used in a quantity of solid preferably 0.5%-30% by weight. When using laser systems in the visible region of the spectrum, which can also be desirable if both the substrate (for example glass or transparent plastic materials) and the transparent conductive oxides are transparent in the visible region of the electromagnetic spectrum, one can choose other pigments which absorb at wavelengths belonging to the above said region of the spectrum. For laser systems in the green region of the spectrum (for example a doubled laser system Nd.YAG at 532nm or an argon laser between 490nm and 510nm, or a pulse dye laser at 595 nm) a pigment can be used and dispersed in the paste of Ti0 2 as absorbing medium which absorbs strongly in the region of the green (for example, the pigment Epolight 7276C of Epolin Inc.). Other non-limiting examples of suitable pigments include those known on the market under the names SDA8703, Epolight 7541 , SDA5725, SDA7047, SDA7591 , SDA8700, SDA8817, and mixtures of these pigments.

In another embodiment of the present invention the absorbing pigment is dispersed in a specific layer (light absorbing layer) so that only that layer strongly absorbs the laser radiation. The heat will be transferred by the light absorbing layer to the other layers by conduction.

In another embodiment of this invention, inorganic micro-or nano- crystals are used in the formulation of the paste of nanocrystalline metal oxide, which have an absorption spectrum which reaches a peak in correspondence of the wavelengths of the laser, instead of organic or metallo-organic pigments.

The examples hereinafter 1 reported have been focused on the preparation and sintering of metal oxide films for DSC. It will be apparent to a person skilled in the art that the present invention can be equally applied to other devices and applications such as for example but not limited to photocatalytic, electrochromic, gas detection, photocatalytic water splitting, hydrogen storage and hybrid photovoltaic devices. The same procedure of laser sintering can be applied to other nanocrystalline oxides with wide band gap such as (but not limited to) MgO, CdO, Fe 2 O 3 , Sn0 2 , ZnO, CdSe, CdS, W0 3 , Nb 2 0 5 , and Ta 2 0 5 .

Example 1

In order to obtain a colloidal paste of nanocrystalline Ti0 2 for the manufacture of DSC solar cells a formulation was used in some points similar to that disclosed by S. Ito, P. Chen, P. Comte, MK Nazeeruddin, P. Liska, P. Pechy, M. Gratzel, Prog. Photovolt: Res Appl. 2007, 15, 603, but with some differences, in particular the introduction of absorbing pigments. One at a time, in the order: 6g of nanoparticles of TiO 2 , 1 ml of water, 1 ml of acetic acid, 80ml of ethanol, ethyl cellulose (3g: 30g of a 10% solution in ethanol) and finally 30 ml of methylene chloride in solution with the absorbing pigment IRA 980BT were introduced and well mixed in a mortar.

In particular, the used nanoparticles of TiO 2 have a diameter of 13 nm (P90Degussa) with the addition of some particles with a variable diameter in the range 300 pm - 400 pm (Pi-kem) in the proportion by weight of 0,5g for each 6g of P90. These larger particles diffuse into the active layer part of the light otherwise lost.

The pigment, added in solution with methylene chloride, was IRA980BT (manufactured by Exciton) with a concentration of about 13.5 g/L in total considering all the solvents used. This pigment absorbed in the infrared, while maintaining a significant absorption even at wavelengths of about 064nm which is the value of the wavelength of the neodymium laser sources. The neodymium laser sources are among the most economical laser sources available on the market both under pulsed regime CW than with optical powers with average emission from a few mW to a few kW. The whole was subsequently introduced into a multiple roller grinder and milled for a few hours. Using the technique of blade coating, the paste thus obtained was deposited on an area of 5mm x 5mm on a glassy (soda lime) and conductive substrate (tin oxide doped with fluorine (fluorine tin oxide-FTO) with a surface resistance of

8 Ω cm "2 ) which had been previously washed in an ultrasonic bath, first with acetone and then with ethanol. The height of the blade relative to the plane of the substrate was set at about 150 pm. The colloidal film thus obtained was dried on a hot plate at 100°C for 10 minutes, this phase being preferable but not necessary. As the next step, the laser scanning of the surface of the paste of Ti0 2 was performed. It was used a Nd:YV0 4 pulsed laser system, with a repetition rate of the pulses of about 30 kHz, average optical output power of about 30W maximum, the wavelength of emission equal to 1064nm and a pair of xy axes for moving the sample controlled via a software interface. Once the average power output of the laser (about 10W) was set, the scanning sintering process has been optimized by varying the distance of the substrate from the focal plane, the scanning speed and the distance between two subsequent scanning lines. Subsequently, the substrates were immersed in a solution of ethanol and the dye capable of absorbing visible light, which makes the film of TiO 2 active, as previously mentioned, for about 12 hours. It is used a solution in ethanol 0.5 mM of a ruthenium-based organometallic dye, known by the name N719, and in particular the product marketed by Dyesol with the name B2.

In parallel the counter electrodes were manufactured, depositing a nanometric layer of Pt on glass and conductive substrates. This layer was obtained by depositing with the technique of blade coating a layer of a paste based on hexachloroplatinic acid (produced and marketed by Dyesol), a precursor of Pt and from which the above said nanometer layer of Pt is obtained, after suitable heat treatment to about 430°C for 15 minutes in the oven. The distance between the blade and the plane of the glassy and conductive substrate was about 80 microns. The two electrodes were then joined and sealed by means of a film thick about 60 m of thermoplastic material (0.5 bar pressure used at a temperature of about 90°C for about 40 seconds) known under the name Surlyn. Through a hole with a diameter of 0.5 mm (subsequently sealed) practiced in the counter electrode the liquid electrolyte was finally injected. The liquid electrolyte used is a solution in 3-methoxypropionitrile of the redox couple I7I 3 " and in particular the product marketed by Dyesol with the name "High

Stability Electrolyte - EL-HSE" is used.

The cell was then measured under a solar simulator in a condition of illuminance equal to 1 W/m 2 AM 1.5.

Example 2

In this second example, for the manufacture of DSC solar cells it is prepared a colloidal paste of nanocrystalline TiO 2 following the same guidelines and procedures listed in Example 1 except for the type and amount of absorbing pigments used. In fact, in this second example 140μΙ of methanol in solution with the pigment of the absorbent Epolight 7276C Epolin Inc. were added (4.7 g of colloidal paste) with a concentration of 30 g/L in total about considering all the solvents used. This pigment absorbs in the visible and in particular at wavelengths of approximately 532nm, which is the value of the wavelength of the neodymium laser sources duplicated in frequency through non-linear conversion processes [O. Quick, and DC Hanna, Principles of Lasers, Springer, USA 1998]. Even the neodymium laser sources duplicated in frequency are between the cheaper laser sources available on the market (especially if operating in the pulsed regime) with medium optical powers issuing from a few mW up to a few hundred W. The whole was subsequently introduced into a multiple roller grinder and milled for a few hours. Using the technique of blade coating, the paste thus obtained was deposited on an area of 5mm x 5mm on a glass (soda lime) and conductive substrate (tin oxide doped with fluorine (fluorine tin oxide-FTO) with surface resistance of 8 Ω cm "2 ) which had been previously washed in an ultrasonic bath, first with acetone and then with ethanol: The height of the blade relative to the plane of the substrate was fixed at about 150 pm. The colloidal film thus obtained was dried on a hot plate at 100°C for 10 minutes, this phase being preferable but not necessary. As the next step, the laser scanning of the surface of the TiO 2 paste was performed. It was used a system based on a pulsed Nd:YV04 laser frequency doubled, with a repetition rate of the pulses of about 30 kHz, average optical power output of about 0W maximum, the wavelength of emission equal at 532nm and a pair of xy axes for moving the sample controlled via a software interface. Once the average power output of the laser was set (about 7W), the scanning sintering process was carried out by setting the scan speed at 1.2 mm s " 1 and the distance between two successive scan lines at 0.5 mm. Subsequently, the substrates were immersed in a solution of ethanol and the dye capable of absorbing visible light, which makes the film of TiO 2 active , as previously said, for about 12 hours. It was used a solution in etha ol 0.5 mM of a ruthenium-based organometallic dye, known by the name N719, and in particular the product marketed by Dyesol with the name B2.

In parallel, counter electrodes were manufactured by following the same process and procedures disclosed in example 1. The two electrodes were then joined and sealed also using the same materials and the same procedures disclosed in example 1. Through a hole with a diameter of 0.5 mm (subsequently sealed) drilled in the counter electrode the liquid electrolyte was finally injected. Also in this example, as in Example 1 , the liquid electrolyte used is a solution in 3-methoxypropionitrile of the redox couple I7I 3 " , and in particular it is used the product marketed by Dyesol with the name "High Stability Electrolyte - EL-HSE".

The cell was then measured under a solar simulator in a condition of illuminance equal to 1 W/m 2 AM 1.5.

Example 3

In a particularly preferred embodiment of the present invention, even the counter electrodes of a photoelectrochemical cell are obtained from a preparation of precursors of the material of the counter electrode inside which was added a pigment with high absorption of the radiation in the visible and infrared regions of the electromagnetic spectrum. By way of example, not limitative of the present invention, a formulation of precursors and pigment has been prepared consisting of a solution of hexachloroplatinic acid in 2-propanol (Ito et al. Prog. Photovolt: Res Appl. 2006; 14:589 - 601) to which the pigment 10 mM IRA980BT (manufactured by Exciton) was added. Also in this case, this pigment has been added in solution with methylene chloride, with a concentration of about 15g/L in total considering all the solvents used. The precursor solution was placed on the FTO substrate/conductive glass with a brush (other printing techniques can be used). As a subsequent step, laser scanning of the surface of the conductive substrate covered by that formulation of precursors and pigment was performed. Repeating what was done in Example 1 for the T1O2, even in this case it was used a system based on a Nd:YV0 4 pulsed laser, already disclosed. Once again, once the average power output of the laser was set (about 10W), the scanning sintering process has been optimized by varying the distance of the substrate from the focal plane, the scanning speed and the distance between two subsequent scan lines. Also in this case the pigment used and introduced into the solution, absorbing the laser radiation, has allowed the development of local heat subsequently absorbed by the precursor, giving rise to the process of transformation of the latter in the final product, ie, Pt.

The present invention has been disclosed for illustrative but not limitative purposes, according to its preferred embodiments, but it is to be understood that variations and/or modifications can be made by those skilled in the art without departing from the scope of protection, as defined by the appended claims.