Title:
SKIN CLEANSER COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2016/093089
Kind Code:
A1
Abstract:
[Problem] To provide a skin cleanser composition that has good cleaning power, a good feeling of foam elasticity, and good foam durability, has excellent deodorization capacity and retention of deodorization capacity, and affords an excellent feeling of moistness in the skin after cleaning. [Solution] Provided is a skin cleanser composition that contains (A) a fatty acid salt, (B) 0.2-10 mass% of at least one selected from highly branched cyclic dextrins and hydroxyalkylated cyclodextrins, and (C) 0.3-10 mass% of at least one selected from ampholytic surfactants and alkylamine oxides, wherein the mass ratio (B/C) between the content (mass%) of (B) at least one selected from highly branched cyclic dextrins and hydroxyalkylated cyclodextrins, and the content (mass%) of (C) at least one selected from ampholytic surfactants and alkylamine oxides is 0.1-30.
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Inventors:
INOUE CHIEKO (JP)
Application Number:
PCT/JP2015/083493
Publication Date:
June 16, 2016
Filing Date:
November 27, 2015
Export Citation:
Assignee:
LION CORP (JP)
International Classes:
A61K8/36; A61K8/41; A61K8/42; A61K8/73; A61Q19/10
Foreign References:
JP2006182698A | 2006-07-13 | |||
JPH08269492A | 1996-10-15 | |||
JP2003095906A | 2003-04-03 | |||
JP2003012485A | 2003-01-15 | |||
JP2003286500A | 2003-10-10 | |||
JPH08268876A | 1996-10-15 | |||
JPH03284611A | 1991-12-16 |
Attorney, Agent or Firm:
HIROTA, Koichi et al. (JP)
Koichi Hirota (JP)
Koichi Hirota (JP)
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