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Patent Searching and Data


Title:
SKIN CLEANSER COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2020/262154
Kind Code:
A1
Abstract:
[Problem] The purpose of the present invention is to provide a skin cleanser composition which has excellent cleansing power, while being reduced in skin irritancy. [Solution] A skin cleanser composition which has a pH of from 3 to 8, and contains (A) a surfactant and (B) an amphiphilic ester, wherein the content of component (A) is from 0.025% by weight to 2% by weight. This skin cleanser composition is able to exhibit excellent cleansing power, while being reduced in skin irritancy. Consequently, a skin cleanser composition according to the present invention is suitable for use in cleansing of the skin that has become sensitive to stimulation.

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Inventors:
YAMAMOTO KOUHEI (JP)
KUBO HIROKAZU (JP)
Application Number:
PCT/JP2020/023781
Publication Date:
December 30, 2020
Filing Date:
June 17, 2020
Export Citation:
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Assignee:
KOBAYASHI PHARMACEUTICAL CO LTD (JP)
International Classes:
A61Q19/10; A61K8/39; C11D1/74; C11D3/20
Foreign References:
JP2019059679A2019-04-18
JP2011126805A2011-06-30
JP2016069320A2016-05-09
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