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Title:
SLUDGE RECOVERY METHOD AND GRANULAR MATERIAL
Document Type and Number:
WIPO Patent Application WO/2014/034924
Kind Code:
A1
Abstract:
Provided is a sludge recovery method for forming a stable oxide film and thereby suppressing oxidation of a powder of matter to be treated present in a sludge, and readily recovering a large quantity of matter to be treated. A method for recovering Si from a sludge comprising a powder of the Si generated in processing of the Si in water or an aqueous solution, wherein the method comprises a stable oxide film formation step for supplying a gas comprising at least an oxygen component (O) to a fresh surface of the powder generated by the processing of the Si in the water or aqueous solution and forming a stable oxide film.

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Inventors:
TATSUMI KOHEI (JP)
Application Number:
PCT/JP2013/073498
Publication Date:
March 06, 2014
Filing Date:
September 02, 2013
Export Citation:
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Assignee:
UNIV WASEDA (JP)
International Classes:
C01B33/02
Domestic Patent References:
WO2010125942A12010-11-04
Foreign References:
JP2010001181A2010-01-07
JP2011225399A2011-11-10
JP2011527279A2011-10-27
Attorney, Agent or Firm:
HIRAI YASUO (JP)
Yasuo Hirai (JP)
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