Title:
SOLAR CELL MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2017/221710
Kind Code:
A1
Abstract:
Provided is a solar cell manufacturing method by which an optimally textured structure can be formed on a surface of a silicon substrate. With respect to the silicon substrate, an attach step, a first etching step, and a second etching step are performed in sequence. In the attach step, the silicon substrate is dipped in a first aqueous solution in which hydrofluoric acid and silver nitrate are contained in water, to cause silver to attach to the surface of the silicon substrate. The first aqueous solution is prepared such that the silver nitrate has a molarity in a range of not less than 9 × 10-5 (mol/L) and not more than 1 × 10-3 (mol/L). In the first etching step, the silicon substrate is dipped in a second aqueous solution in which hydrofluoric acid and hydrogen peroxide are contained in water, the silicon substrate is etched using precipitated silver as a catalyst, and a number of pores are formed in the surface of the silicon substrate, making the surface porous. In the second etching step, the silicon substrate is dipped in a third aqueous solution in which hydrofluoric acid and nitric acid are contained in water and etched, thereby increasing the depth and opening size of the pores.
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Inventors:
KUMAGAI AKIRA (JP)
Application Number:
PCT/JP2017/021151
Publication Date:
December 28, 2017
Filing Date:
June 07, 2017
Export Citation:
Assignee:
J E T CO LTD (JP)
International Classes:
H01L31/0236
Domestic Patent References:
| WO2014166256A1 | 2014-10-16 | |||
| WO2012150669A1 | 2012-11-08 |
Foreign References:
| JP2014146712A | 2014-08-14 | |||
| US20150357506A1 | 2015-12-10 |
Attorney, Agent or Firm:
YOSHIDA Tadanori (JP)
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