Title:
SOLAR CELL MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2021/124991
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing a solar cell manufacturing method that reduces peeling residue of a pattern printing resist, and that reduces damage to a third intrinsic semiconductor layer during the manufacturing process. The solar cell manufacturing method according to the present invention comprises, in this order: a step for forming, on a back surface side of a semiconductor substrate (11), a material film for a first intrinsic semiconductor layer and a material film for a first conductivity-type semiconductor layer; a step for forming a pattern printing resist on the material film for the first conductivity-type semiconductor layer in a first region (7) on the back surface side of the semiconductor substrate (11), and not forming the pattern printing resist on a light-receiving surface side of the semiconductor substrate (11); a step for forming, using the pattern printing resist in the first region (7) on the back surface side of the semiconductor substrate (11), a first intrinsic semiconductor layer (23) and a first conductivity-type semiconductor layer (25) that are patterned; a step for removing the pattern printing resist; and a step for forming a third intrinsic semiconductor layer (13) on the light-receiving surface side of the semiconductor substrate (11).
Inventors:
WATANABE SHINGO (JP)
SUEZAKI TAKASHI (JP)
SUEZAKI TAKASHI (JP)
Application Number:
PCT/JP2020/045730
Publication Date:
June 24, 2021
Filing Date:
December 08, 2020
Export Citation:
Assignee:
KANEKA CORP (JP)
International Classes:
H01L31/18; H01L31/0747
Domestic Patent References:
| WO2015189878A1 | 2015-12-17 | |||
| WO2019216339A1 | 2019-11-14 |
Foreign References:
| JP2013509695A | 2013-03-14 | |||
| JP2012089829A | 2012-05-10 | |||
| JP2013239476A | 2013-11-28 | |||
| US20180198002A1 | 2018-07-12 |
Attorney, Agent or Firm:
NIIYAMA Yuichi et al. (JP)
Download PDF: