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Title:
SOLID-STATE IMAGE CAPTURE ELEMENT RETAINING SUBSTRATE AND FABRICATION METHOD THEREFOR, AND SOLID-STATE IMAGE CAPTURE DEVICE
Document Type and Number:
WIPO Patent Application WO/2014/087900
Kind Code:
A1
Abstract:
Provided is a retaining substrate for retaining an IR cut filter whereby occurrences of flares or ghosts are alleviated. A solid-state image capture device comprises an image sensor, a circuit substrate, a retaining substrate, an IR cut filter, a photographic lens, a lens holder, and a retaining tube. The image sensor is mounted upon the circuit substrate. The circuit substrate is anchored upon the retaining substrate in a state of the image sensor being inserted in an aperture of a substrate main body of the retaining substrate, with lateral faces of said image sensor being covered by the retaining substrate. The IR cut filter is anchored upon the retaining substrate so as to cover the aperture. The image sensor is positioned on the exit face side of the photographic lens, and the IR cut filter is positioned between the photographic lens and the image sensor. A light blocking layer is formed upon the entire circumference of the inner wall face of the substrate main body. Detrimental light is blocked by the light blocking layer.

Inventors:
MURAYAMA, Satoru (4000 Kawashiri, Yoshida-cho, Haibara-gu, Shizuoka 96, 〒4210396, JP)
HIGUCHI, Reiji (4000 Kawashiri, Yoshida-cho, Haibara-gu, Shizuoka 96, 〒4210396, JP)
Application Number:
JP2013/081907
Publication Date:
June 12, 2014
Filing Date:
November 27, 2013
Export Citation:
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Assignee:
FUJIFILM CORPORATION (26-30, Nishiazabu 2-chome Minato-k, Tokyo 20, 〒1068620, JP)
International Classes:
H01L27/14; G02B5/00; G02B5/26; G02B7/02; G03B11/00; H04N5/225
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See also references of EP 2927959A4
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Attorney, Agent or Firm:
KOBAYASHI, Kazunori (Taiyo-seimei-otsuka Bldg. 3F, 25-1 Kita-otsuka 2-chome, Toshima-k, Tokyo 04, 〒1700004, JP)
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