Title:
SOLID-STATE IMAGING DEVICE AND ELECTRONIC APPARATUS
Document Type and Number:
WIPO Patent Application WO/2022/145190
Kind Code:
A1
Abstract:
A solid-state imaging device according to one embodiment of the present disclosure comprises a semiconductor substrate, a floating diffusion region, a conversion efficiency switching transistor, and a first pixel separation part. The semiconductor substrate has an opposing first surface and second surface, and has, embedded and formed in each pixel, a photoelectric conversion unit that generates, through photoelectric conversion, an electric charge according to a light-reception amount. The floating diffusion region is provided in the semiconductor substrate to accumulate electric charge generated in the photoelectric conversion unit. The conversion efficiency switching transistor can vary the capacity of the floating diffusion region. The first pixel separation part is provided in the semiconductor substrate, contains a conductive material, separates the region between adjacent pixels, and is also connected to the floating diffusion region through the conversion efficiency switching transistor.
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Inventors:
TANOUE SUMIE (JP)
Application Number:
PCT/JP2021/045289
Publication Date:
July 07, 2022
Filing Date:
December 09, 2021
Export Citation:
Assignee:
SONY SEMICONDUCTOR SOLUTIONS CORP (JP)
International Classes:
H01L21/76; H01L27/146; H04N5/355; H04N5/3745
Domestic Patent References:
| WO2017130728A1 | 2017-08-03 | |||
| WO2018190363A1 | 2018-10-18 | |||
| WO2005083790A1 | 2005-09-09 |
Foreign References:
| JP2014192348A | 2014-10-06 | |||
| JP2007221121A | 2007-08-30 |
Attorney, Agent or Firm:
TSUBASA PATENT PROFESSIONAL CORPORATION (JP)
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