Title:
SOLID-STATE IMAGING DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/009816
Kind Code:
A1
Abstract:
A solid-state imaging device according to the present invention is provided with: a silicon substrate (5) on which a plurality of pixels (22), each having a photoelectric conversion region (21), are arranged; an insulating film (4) which is formed on the silicon substrate (5); a relief pattern (3) which is formed on the insulating film (4); and a planarization film (2) which covers the relief pattern (3). The relief pattern (3) is formed of a high-refractive-index material which has a refractive index higher than the refractive index of the planarization film (2).
Inventors:
YOKOYAMA TOSHIFUMI (JP)
MIZUNO IKUO (JP)
NISHI YOSHIAKI (JP)
MIZUNO IKUO (JP)
NISHI YOSHIAKI (JP)
Application Number:
PCT/JP2019/027807
Publication Date:
January 21, 2021
Filing Date:
July 12, 2019
Export Citation:
Assignee:
TOWERJAZZ PANASONIC SEMICONDUCTOR CO LTD (JP)
International Classes:
H01L27/146; H04N5/369
Foreign References:
| JP2019114642A | 2019-07-11 | |||
| JP2015032636A | 2015-02-16 | |||
| JP2011210981A | 2011-10-20 | |||
| JP2009004533A | 2009-01-08 |
Attorney, Agent or Firm:
MAEDA & PARTNERS (JP)
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