Title:
SOLUTION CONTAINING LABEL PRECURSOR COMPOUND FOR RADIOACTIVE FLUORINE-LABELED COMPOUND
Document Type and Number:
WIPO Patent Application WO/2020/039962
Kind Code:
A1
Abstract:
The present invention provides a solution which is for improving the stability of a precursor compound for a radioactive fluorine-labeled compound, and in which a compound represented by formula (2) or a salt thereof is stored in a state of being dissolved in an organic solvent (in the formula, X1 represents a hydrogen atom or a halogen atom, X2 represents a fluorine atom or a nitrile group, R1 represents a substituted or unsubstituted alkylsulfonyloxy group, or a substituted or unsubstituted arylsulfonyloxy group).
Inventors:
ICHIKAWA HIROAKI (JP)
OKUMURA YUKI (JP)
WATANABE YURIE (JP)
SEKIGUCHI KO (JP)
SUZUKI MAKI (JP)
OKUMURA YUKI (JP)
WATANABE YURIE (JP)
SEKIGUCHI KO (JP)
SUZUKI MAKI (JP)
Application Number:
PCT/JP2019/031383
Publication Date:
February 27, 2020
Filing Date:
August 08, 2019
Export Citation:
Assignee:
NIHON MEDIPHYSICS CO LTD (JP)
International Classes:
A61K51/00; A61K31/4439
Domestic Patent References:
| WO2015199205A1 | 2015-12-30 | |||
| WO2019131458A1 | 2019-07-04 |
Attorney, Agent or Firm:
IDE Masatake (JP)
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