Title:
SOLUTION PROCESSIBLE HARDMARKS FOR HIGH RESOLUSION LITHOGRAPHY
Document Type and Number:
WIPO Patent Application WO/2012/118847
Kind Code:
A3
Abstract:
Solution processible hardmasks are described that can be formed from aqueous precursor solutions comprising polyoxometal clusters and anions, such as polyatomic anions. The solution processible metal oxide layers are generally placed under relatively thin etch resist layers to provide desired etch contrast with underlying substrates and/or antireflective properties. In some embodiments, the metal oxide hardmasks can be used along with an additional hardmask and/or antireflective layers. The metal oxide hardmasks can be etched with wet or dry etching. Desirable processing improvements can be obtained with the solution processible hardmasks.
Inventors:
STOWERS JASON K (US)
MEYERS STEPHEN T (US)
KOCSIS MICHAEL (US)
KESZLER DOUGLAS A (US)
GRENVILLE ANDREW (US)
MEYERS STEPHEN T (US)
KOCSIS MICHAEL (US)
KESZLER DOUGLAS A (US)
GRENVILLE ANDREW (US)
Application Number:
PCT/US2012/027002
Publication Date:
January 03, 2013
Filing Date:
February 28, 2012
Export Citation:
Assignee:
INPRIA CORPORTION (US)
STOWERS JASON K (US)
MEYERS STEPHEN T (US)
KOCSIS MICHAEL (US)
KESZLER DOUGLAS A (US)
GRENVILLE ANDREW (US)
STOWERS JASON K (US)
MEYERS STEPHEN T (US)
KOCSIS MICHAEL (US)
KESZLER DOUGLAS A (US)
GRENVILLE ANDREW (US)
International Classes:
H01L21/027; H01L21/312
Foreign References:
| JP2001272786A | 2001-10-05 | |||
| US20110045406A1 | 2011-02-24 | |||
| US20050242330A1 | 2005-11-03 |
Attorney, Agent or Firm:
DARDI, Peter S. et al. (PLLCMoore Lake Plaza, Suite 205,1250 East Moore Lake Driv, Fridley MN, US)
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