SOLVENT-DEVELOPABLE NEGATIVE RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND METHOD FOR FORMING PATTERN OF LAYER INCLUDING BLOCK COPOLYMER

WIPO Patent Application WO/2012/169620

A1

A solvent-developable negative resist composition containing a base material component (A) and an acid generator component (B), the polarity of the base material component increasing and the solubility of the base material with respect to a developing solution containing an organic solvent decreasing due to the action of an acid, the acid generator component generating an acid under exposure to light; the base material component (A) containing a resin material (A1) having a constituent unit (a2) and a constituent unit (a1), the constituent unit (a2) being derived from an acrylic acid ester including a 4- to 12-membered lactone-containing cyclic group, a 3- to 7-membered ether-containing cyclic group, or a 5- to 7-membered carbonate-containing cyclic group, and the constituent unit (a1) being derived from an acrylic acid ester including an acid-degradable group, the polarity of which increases due to an action of an acid; the acid generator component (B) including an acid generator (B1) comprising a component that generates sulfonic acid under exposure to light.

JP4439915	A bisimide compound, an acid generator using the bisimide compound, a resist composition, and a pattern forming method using the composition.
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JPS60223826	MANUFACTURE OF RADIATION REACTIVE PRECURSOR

SENZAKI TAKAHIRO (JP)
MIYAGI KEN (JP)
FUJIKAWA SHIGENORI (JP)
KOIZUMI MARI (JP)
HAYAKAWA HARUMI (JP)

PCT/JP2012/064811

December 13, 2012

June 08, 2012

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TOKYO OHKA KOGYO CO LTD (JP)
RIKEN (JP)
SENZAKI TAKAHIRO (JP)
MIYAGI KEN (JP)
FUJIKAWA SHIGENORI (JP)
KOIZUMI MARI (JP)
HAYAKAWA HARUMI (JP)

G03F7/038; G03F7/004; G03F7/039; G03F7/40

WO2012043415A1	2012-04-05
WO2012046770A1	2012-04-12

JP2010164958A	2010-07-29
JP2010113334A	2010-05-20
JP2011013479A	2011-01-20
JP2011221513A	2011-11-04
JP2012032780A	2012-02-16
JP2011191727A	2011-09-29
JP2012108369A	2012-06-07

DANIEL P. SANDERS ET AL.: "Integration of Directed Self-Assembly with 193 nm Lithography", JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, vol. 23, no. 1, 16 July 2010 (2010-07-16), pages 11 - 18
JOY Y. CHENG ET AL.: "Simple and Versatile Method To Integrate Directed Self-Assembly with Optical Lithography Using a Pol", ACS NANO, vol. 4, no. 8, 15 July 2010 (2010-07-15), pages 4815 - 4823

TANAI Sumio et al. (JP)
Sumio Tanai (JP)

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