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Title:
SOLVENT RESISTANT COPOLYMERS
Document Type and Number:
WIPO Patent Application WO2003083577
Kind Code:
A3
Abstract:
A radiation-sensitive composition for use in printing plates is described. The composition comprises: (a) at least one novolak; (b) at least one naphthoquinone diazide derivative; and (c) a copolymer comprising units A, B, and C:

Inventors:
JAREK MATHIAS
Application Number:
PCT/EP2003/003559
Publication Date:
March 25, 2004
Filing Date:
March 13, 2003
Export Citation:
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Assignee:
KODAK POLYCHROME GRAPHICS GMBH (DE)
International Classes:
C08F222/40; G03F7/023; (IPC1-7): G03F7/023; C08F222/40
Foreign References:
EP0737896A21996-10-16
EP1074887A12001-02-07
US2871223A1959-01-27
US5652295A1997-07-29
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