SOLVENT-SOLUBLE BLOCK COPOLYIMIDE COMPOSITION AND PROCESS FOR PRODUCING THE SAME

Title:

SOLVENT-SOLUBLE BLOCK COPOLYIMIDE COMPOSITION AND PROCESS FOR PRODUCING THE SAME

Document Type and Number:

WIPO Patent Application WO/2003/060010

Kind Code:

A1

Abstract:

A block copolyimide composition in which the block copolymide is a polyimide obtained by heating a tetracarboxylic dianhydride and a diamine in a solvent comprising at least one member selected among ketones, ethers, and esters in the presence of a catalyst comprising a lactone and a base; a positive block-copolymerization-type polyimide composition containing a photo-acid generator; an ink; and processes for producing these. The block copolyimide is characterized by suffering no blushing even in the air.

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Inventors:

JIN XINGZHOU (JP)
ISHII HIROYUKI (JP)
MIYAMURA MASATAKA (JP)
ITATANI HIROSHI (JP)
HORI SHINICHIRO (JP)
TANIGUCHI AKIHITO (JP)

Application Number:

PCT/JP2003/000252

Publication Date:

July 24, 2003

Filing Date:

January 15, 2003

Export Citation:

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Assignee:

PI R & D CO LTD (JP)
JIN XINGZHOU (JP)
ISHII HIROYUKI (JP)
MIYAMURA MASATAKA (JP)
ITATANI HIROSHI (JP)
HORI SHINICHIRO (JP)
TANIGUCHI AKIHITO (JP)

International Classes:

C08G73/10; G03F7/023; G03F7/039; (IPC1-7): C08L79/08; C08G73/10; G03F7/037

Domestic Patent References:

WO2000041884A1

2000-07-20

Foreign References:

JPH11202488A	1999-07-30
JPH0940777A	1997-02-10
JPH04108880A	1992-04-09
EP0957126A1	1999-11-17

Other References: