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Title:
SOURCE-COLLECTOR DEVICE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2013/107686
Kind Code:
A3
Abstract:
A source-collector device is constructed and arranged to generate a radiation beam. The device includes a target unit constructed and arranged to present a target surface (301) of plasma-forming material; a laser unit (50) constructed and arranged to generate a beam of radiation directed onto the target surface so as to form a plasma (51) from said plasma-forming material; a contaminant trap (302) constructed and arranged to reduce propagation of particulate contaminants generated by the plasma; a radiation collector (303) comprising a plurality of grazing-incidence reflectors (303a) arranged to collect radiation emitted by the plasma and form a beam therefrom; and a filter (304) constructed and arranged to attenuate at least one wavelength range of the beam.

Inventors:
YAKUNIN ANDREI (NL)
BANINE VADIM (NL)
MOORS ROEL (NL)
VAN SCHOOT JAN (NL)
VERHAGEN MARTINUS (NL)
FRIJNS OLAV (NL)
KRIVTSUN VLADIMIR (RU)
SWINKELS GERARDUS (NL)
RIEPEN MICHEL (NL)
SCHIMMEL HENDRIKUS (NL)
MEDVEDEV VIACHESLAV (RU)
Application Number:
PCT/EP2013/050406
Publication Date:
December 12, 2013
Filing Date:
January 10, 2013
Export Citation:
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Assignee:
ASML NETHERLANDS BV (NL)
International Classes:
G03F7/20; H05G2/00
Foreign References:
US20110134405A12011-06-09
US20110133641A12011-06-09
US20090095924A12009-04-16
US20110101863A12011-05-05
US20070090304A12007-04-26
US20080137050A12008-06-12
Other References:
GUIDO SCHRIEVER: "Laser-produced plasma versus laser-assisted discharge plasma: physics and technology of extreme ultraviolet lithography light sources", JOURNAL OF MICRO/NANOLITHOGRAPHY, MEMS AND MOEMS, vol. 11, no. 2, 29 May 2012 (2012-05-29), pages 021104, XP055071643, ISSN: 1932-5150, DOI: 10.1117/1.JMM.11.2.021104
Attorney, Agent or Firm:
SLENDERS, Peter (AH Veldhoven, NL)
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