Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
SPACER FOR SPARK PLASMA SINTERING, SPARK PLASMA SINTERING DEVICE, AND SPARK PLASMA SINTERING METHOD
Document Type and Number:
WIPO Patent Application WO/2018/012332
Kind Code:
A1
Abstract:
Provided is a silicon carbide spacer which is capable of suppressing the occurrence of breakages due to spark plasma sintering to enable stable spark plasma sintering. This spacer for spark plasma sintering is a silicon carbide spacer 12 that includes silicon carbide and has a frustoconical shape. The silicon carbide spacer 12 is placed, in a spark plasma sintering device 1, between a punch 112 of a mold 11 for spark plasma sintering that has a cylinder 111 and the punch 112, and a pressurization ram 14 that applies pressure to the punch 112, with the small flat surface 21 of the frustoconical shape disposed on the punch 112 side. Additionally, the diameter (ds) of the small flat surface 21 is preferably configured such that the ratio thereof to the punch 112 diameter (a) satisfies the relationship 1≤ds/a≤1.5.

Inventors:
KAKEGAWA KAZUYUKI (JP)
NAKAMURA NOBUO (JP)
Application Number:
PCT/JP2017/024300
Publication Date:
January 18, 2018
Filing Date:
July 03, 2017
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
SUMITOMO METAL MINING CO (JP)
KAKEGAWA KAZUYUKI (JP)
International Classes:
C04B35/645; B22F3/105; B22F3/14; B28B3/00; C04B35/569
Foreign References:
JP2001048659A2001-02-20
JP2004277769A2004-10-07
Other References:
OLEVSKY, EUGENE A. ET AL.: "Fundamental Aspects of Spark Plasma Sintering: 1. Experimental Analysis of Scalability", JOURNAL OF AMERICAN CERAMIC SOCIETY, vol. 95, no. 8, 2 May 2012 (2012-05-02) - 3 August 2012 (2012-08-03), pages 2406 - 2413, XP055602253, ISSN: 0002-7820, DOI: 10.1111/j.1551-2916.2012.05203.x
KAKEGAWA, KAZUYUKI ET AL.: "SPS using SiC die", KEY ENGINEERING MATERIALS, vol. 617, 24 June 2014 (2014-06-24), pages 72 - 77, XP055602260, ISSN: 1013-9826, DOI: 10.4028/www.scientific.net/KEM.617.72
Attorney, Agent or Firm:
SHOBAYASHI, Masayuki et al. (JP)
Download PDF: