Title:
SPIN-ON CARBON HARD MASK COMPOSITION WITH HIGH PLANARIZATION PERFORMANCE AND PATTERNING METHOD USING SAME
Document Type and Number:
WIPO Patent Application WO/2023/195636
Kind Code:
A1
Abstract:
The present invention relates to a spin-on carbon hard mask composition with higher planarization performance, which is useful in semiconductor lithography processes, and a patterning method using same. The composition according to the present invention contains the 3',6'-Dihydroxy-3H-spiro[2-benzofuran-1,9'-xanthen]-3-one derivative polymer represented by the following chemical formula 1, an organic solvent, and a surfactant and exhibits excellent effects including excellent solubility, uniform coating performance, high etch-resistance enduring multi-etch processes, excellent mechanical properties, and high planarization properties.
Inventors:
LEE SU JIN (KR)
KIM GI HONG (KR)
LEE JEONG HUN (KR)
LEE SEUNG HUN (KR)
LEE SEUNG HYUN (KR)
KIM GI HONG (KR)
LEE JEONG HUN (KR)
LEE SEUNG HUN (KR)
LEE SEUNG HYUN (KR)
Application Number:
PCT/KR2023/002689
Publication Date:
October 12, 2023
Filing Date:
February 27, 2023
Export Citation:
Assignee:
YOUNG CHANG CHEMICAL CO LTD (KR)
International Classes:
G03F7/11; C08G61/12; C08L65/00; H01L21/308
Foreign References:
| KR20140144662A | 2014-12-19 | |||
| JP2017078165A | 2017-04-27 | |||
| JP2017092457A | 2017-05-25 | |||
| JP2017014191A | 2017-01-19 | |||
| KR20130026988A | 2013-03-14 | |||
| KR102479017B1 | 2022-12-19 |
Attorney, Agent or Firm:
HAEDAM IP GROUP (KR)
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