Title:
SPUTTERING TARGET COMPRISING OXIDE PHASE DISPERSED IN CO OR CO ALLOY PHASE, MAGNETIC MATERIAL THIN FILM COMPRISING CO OR CO ALLOY PHASE AND OXIDE PHASE, AND MAGNETIC RECORDING MEDIUM PRODUCED USING THE MAGNETIC MATERIAL THIN FILM
Document Type and Number:
WIPO Patent Application WO/2011/070850
Kind Code:
A1
Abstract:
Disclosed is a sputtering target comprising an oxide phase dispersed in a Co or Co alloy phase. The sputtering target comprises: a Co-containing metal matrix phase; and a phase containing SiO2 and having an oxide dispersed therein in an amount of 6 to 14 mol% so as to form particles (referred to as "an oxide phase", hereinafter). The sputtering target is characterized in that a Cr oxide is scattered in the oxide phase or the surface area of the oxide phase in an amount of not less than 0.3 mol% and less than 1.0 mol% in addition to components constituting the metal matrix phase and the oxide phase, and the average surface area of particles contained in the oxide phase is 2.0 μm2 or less. The sputtering target comprising an oxide phase dispersed in a Co or Co alloy phase enables the reduction in arcing, can achieve steady electrical discharge in a magnetron sputtering device, and produces a reduced amount of particles upon sputtering at a high density.
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Inventors:
IKEDA Yuki (187-4 Usuba, Hanakawa-cho, Kitaibaraki-sh, Ibaraki 35, 〒3191535, JP)
池田 祐希 (〒35 茨城県北茨城市華川町臼場１８７番地４ ＪＸ日鉱日石金属株式会社 磯原工場内 Ibaraki, 〒3191535, JP)
NAKAMURA Yuichiro (187-4 Usuba, Hanakawa-cho, Kitaibaraki-sh, Ibaraki 35, 〒3191535, JP)
池田 祐希 (〒35 茨城県北茨城市華川町臼場１８７番地４ ＪＸ日鉱日石金属株式会社 磯原工場内 Ibaraki, 〒3191535, JP)
NAKAMURA Yuichiro (187-4 Usuba, Hanakawa-cho, Kitaibaraki-sh, Ibaraki 35, 〒3191535, JP)
Application Number:
JP2010/067947
Publication Date:
June 16, 2011
Filing Date:
October 13, 2010
Export Citation:
Assignee:
JX Nippon Mining & Metals Corporation (6-3 Otemachi 2-chome, Chiyoda-ku Tokyo, 64, 〒1008164, JP)
ＪＸ日鉱日石金属株式会社 (〒64 東京都千代田区大手町二丁目６番３号 Tokyo, 〒1008164, JP)
IKEDA Yuki (187-4 Usuba, Hanakawa-cho, Kitaibaraki-sh, Ibaraki 35, 〒3191535, JP)
池田 祐希 (〒35 茨城県北茨城市華川町臼場１８７番地４ ＪＸ日鉱日石金属株式会社 磯原工場内 Ibaraki, 〒3191535, JP)
ＪＸ日鉱日石金属株式会社 (〒64 東京都千代田区大手町二丁目６番３号 Tokyo, 〒1008164, JP)
IKEDA Yuki (187-4 Usuba, Hanakawa-cho, Kitaibaraki-sh, Ibaraki 35, 〒3191535, JP)
池田 祐希 (〒35 茨城県北茨城市華川町臼場１８７番地４ ＪＸ日鉱日石金属株式会社 磯原工場内 Ibaraki, 〒3191535, JP)
International Classes:
C23C14/34; C23C14/06; C23C14/14; G11B5/64; G11B5/851; H01F10/16; H01F10/18; H01F41/18
Attorney, Agent or Firm:
OGOSHI Isamu (OGOSHI International Patent Office, Daini-Toranomon Denki Bldg. 5F, 1-10, Toranomon 3-chome, Minato-k, Tokyo 01, 〒1050001, JP)
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