Title:
SPUTTERING TARGET CONTAINER AND SPUTTERING DEVICE
Document Type and Number:
WIPO Patent Application WO/2015/186418
Kind Code:
A1
Abstract:
A container (1) including a holding part (2). The holding part (2) comprises a peripheral part (3) and an inner surface (5). The inner surface (5) has such a depressed shape that the depression becomes deeper from the peripheral part (3) toward the center (4) of the region surrounded by the peripheral part (3). Gallium (6) is held in this depression. The container (1) has, for example, a circular contour in terms of plan-view shape and is formed from a conductive material such as copper (Cu). The gallium (6) is melted and brought into a liquid state by the heat generated by the bombardment of cations of a sputtering gas. The inner surface (5) of the holding part (2) has a shape having a curvature.
Inventors:
WATANABE TETSUYA (JP)
Application Number:
PCT/JP2015/060367
Publication Date:
December 10, 2015
Filing Date:
April 01, 2015
Export Citation:
Assignee:
NISSIN ELECTRIC CO LTD (JP)
International Classes:
C23C14/34; C23C14/35; H01L21/203
Foreign References:
| JP2007505217A | 2007-03-08 | |||
| JP2012251233A | 2012-12-20 | |||
| JP2010037656A | 2010-02-18 | |||
| JP2004149852A | 2004-05-27 | |||
| JPH06128734A | 1994-05-10 |
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