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Title:
SPUTTERING TARGET FOR FORMING MAGNETIC RECORDING MEDIUM FILM AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2012/105205
Kind Code:
A1
Abstract:
Provided are: a sputtering target that is for forming a magnetic recording medium film, is able to form a film having a low ordering temperature, and can suppress the generation of particles; and a method for producing the sputtering target. The sputtering target for forming a magnetic recording medium film comprises a sintered body having a composition represented by the general formula {(FexPt100-x)(100-y)Ay}(100-z)Cz, A being a metal comprising Au and/or Cu, and by atomic ratio, 30 ≤ x ≤ 80, 1 ≤ y ≤ 30, and 3 ≤ z ≤ 63. Also, the method for producing the sputtering target has a step for hot pressing a mixed powder of an AuPt alloy powder and/or a CuPt alloy powder, an AgPt alloy powder, an FePt alloy powder, Pt powder, and graphite powder or carbon black powder in a vacuum or in an inert gas atmosphere.

Inventors:
ISHIYAMA KOUICHI (JP)
NONAKA SOHEI (JP)
YOSUKE MASANORI (JP)
MATSUZAKI HIDEHARU (JP)
Application Number:
PCT/JP2012/000533
Publication Date:
August 09, 2012
Filing Date:
January 27, 2012
Export Citation:
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Assignee:
MITSUBISHI MATERIALS CORP (JP)
ISHIYAMA KOUICHI (JP)
NONAKA SOHEI (JP)
YOSUKE MASANORI (JP)
MATSUZAKI HIDEHARU (JP)
International Classes:
C23C14/34; B22F3/14; C22C1/05; C22C5/02; C22C5/04; C22C30/02; C22C33/02; C22C38/00; G11B5/851
Foreign References:
JP2003313659A2003-11-06
JP2004152471A2004-05-27
Other References:
W.B. MI ET AL.: "Characterization of Cu additive FePt-C granular films", APPLIED SURFACE SCIENCE, vol. 252, 2006, pages 8688 - 8694, XP024893811, DOI: doi:10.1016/j.apsusc.2005.12.006
C.L. PLATT ET AL.: "Use of film thickness and Cu additive to improve (001) texture in MgO/ FePtCu(C) bilayers", JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, vol. 295, 2005, pages 241 - 245, XP005020393, DOI: doi:10.1016/j.jmmm.2005.01.013
Attorney, Agent or Firm:
TAKAOKA, Ryoichi (JP)
Ryoichi Takaoka (JP)
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Claims: