Title:
SPUTTERING TARGET FOR FORMING PERPENDICULAR MAGNETIC RECORDING MEDIUM FILM HAVING LOW RELATIVE PERMEABILITY
Document Type and Number:
WIPO Patent Application WO/2010/067446
Kind Code:
A1
Abstract:
Disclosed is a sputtering target for forming a perpendicular magnetic recording medium film, which has a constituent composition composed of 0.5-15% by mole of a nonmagnetic oxide, 4-20% by mole of Cr, 5-25% by mole of Pt and the balance of Co and unavoidable impurities. The sputtering target has a structure wherein a Co-Cr two-component alloy phase, a Pt phase and a nonmagnetic oxide phase are uniformly dispersed.
Inventors:
NONAKA, Sohei (SANDA PLANT 12-6 Technopark, Sanda-sh, Hyogo 39, 66913, JP)
野中 荘平 (〒39 兵庫県三田市テクノパーク１２－６ 三菱マテリアル株式会社 三田工場内 Hyogo, 66913, JP)
野中 荘平 (〒39 兵庫県三田市テクノパーク１２－６ 三菱マテリアル株式会社 三田工場内 Hyogo, 66913, JP)
Application Number:
JP2008/072564
Publication Date:
June 17, 2010
Filing Date:
December 11, 2008
Export Citation:
Assignee:
MITSUBISHI MATERIALS CORPORATION (3-2 Otemachi 1-chome, Chiyoda-ku Tokyo, 17, 10081, JP)
三菱マテリアル株式会社 (〒17 東京都千代田区大手町一丁目３番２号 Tokyo, 10081, JP)
NONAKA, Sohei (SANDA PLANT 12-6 Technopark, Sanda-sh, Hyogo 39, 66913, JP)
三菱マテリアル株式会社 (〒17 東京都千代田区大手町一丁目３番２号 Tokyo, 10081, JP)
NONAKA, Sohei (SANDA PLANT 12-6 Technopark, Sanda-sh, Hyogo 39, 66913, JP)
International Classes:
G11B5/851
Attorney, Agent or Firm:
SHIGA, Masatake et al. (1-9-2, Marunouchi Chiyoda-k, Tokyo 20, 10066, JP)
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