Title:
SPUTTERING TARGET, LAMINATE, MULTI-LAYER BODY, AND METHOD FOR PRODUCING LAMINATE
Document Type and Number:
WIPO Patent Application WO/2017/099215
Kind Code:
A1
Abstract:
Provided is a sputtering target with which a film can be formed at a high film-forming rate by reactive sputtering of a Zn-Sn complex oxide film. Furthermore, provided are a laminate and a multi-layer body having the Zn-Sn complex oxide film formed by using such a sputtering target, as well as method for producing a laminate. The sputtering target contains 5 to 88 mass% of Zn, 5 to 88 mass% of Sn, and 7 to 90 mass% of Bi, with respect to the total metal content.
Inventors:
OHKOSHI KAZUTO (JP)
WATANABE TOSHINARI (JP)
MIYAKAWA NAOMICHI (JP)
WATANABE TOSHINARI (JP)
MIYAKAWA NAOMICHI (JP)
Application Number:
PCT/JP2016/086699
Publication Date:
June 15, 2017
Filing Date:
December 09, 2016
Export Citation:
Assignee:
ASAHI GLASS CO LTD (JP)
International Classes:
C23C14/34; B32B9/00; C03C17/245; C03C17/36; C03C27/06; C23C14/08
Domestic Patent References:
| WO2014078054A1 | 2014-05-22 | |||
| WO2016132825A1 | 2016-08-25 |
Foreign References:
| JPH1087350A | 1998-04-07 | |||
| JP2005206875A | 2005-08-04 | |||
| JPH10237630A | 1998-09-08 | |||
| JP2008231445A | 2008-10-02 | |||
| JPS60182012A | 1985-09-17 | |||
| JP2015074788A | 2015-04-20 |
Attorney, Agent or Firm:
SAKURA PATENT OFFICE, P.C. (JP)
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