Title:
SPUTTERING TARGET FOR MAGNETIC RECORDING FILM FORMATION AND PRODUCTION METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2016/047578
Kind Code:
A1
Abstract:
An FePt-based sintered body sputtering target containing C and/or BN and characterized by having an AuCu alloy particle area ratio of 0.5%-15% in a polished surface having a vertical cross-section relative to a sputter surface of the target. The present invention addresses the issue of providing a sputtering target whereby particles generated during sputtering are reduced and a magnetic thin film for a magnetic recording medium can be efficiently formed.
Inventors:
OGINO SHIN-ICHI (JP)
Application Number:
PCT/JP2015/076628
Publication Date:
March 31, 2016
Filing Date:
September 18, 2015
Export Citation:
Assignee:
JX NIPPON MINING & METALS CORP (JP)
International Classes:
C23C14/34; C22C5/04; C22C38/00; G11B5/65; G11B5/851; H01F10/14; H01F41/18; B22F3/14; B22F3/15
Domestic Patent References:
| WO2014013920A1 | 2014-01-23 | |||
| WO2013094605A1 | 2013-06-27 |
Foreign References:
| JP2012178210A | 2012-09-13 | |||
| JP2012178211A | 2012-09-13 |
Attorney, Agent or Firm:
OGOSHI Isamu et al. (JP)
Isamu Ogoshi (JP)
Isamu Ogoshi (JP)
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