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Title:
SPUTTERING TARGET FOR MAGNETIC RECORDING MEDIA
Document Type and Number:
WIPO Patent Application WO/2018/083951
Kind Code:
A1
Abstract:
Provided is a sputtering target for magnetic recording media, which is capable of forming a magnetic thin film that is reduced in size and center-to-center spacing of magnetic crystal grains, while maintaining good magnetic characteristics. A sputtering target for magnetic recording media, which contains Pt metal and an oxide, with the balance being made up of Co metal and unavoidable impurities, and wherein: the Co metal is contained in an amount of from 70 at% to 90 at% (inclusive) relative to the total amount of the metal components of the sputtering target for magnetic recording media; the Pt metal is contained in an amount of from 10 at% to 30 at% (inclusive) relative to the total amount of the metal components of the sputtering target for magnetic recording media; the oxide is contained in an amount of from 26 vol% to 40 vol% (inclusive) relative to the whole of the sputtering target for magnetic recording media; and the oxide is composed of B2O3 and one or more high-melting-point oxides having a melting point of from 1,470°C to 2,800°C (inclusive).

Inventors:
THAM, Kim Kong (Tanaka Kikinzoku Kogyo K.K.22, Wadai, Tsukuba-sh, Ibaraki 47, 〒3004247, JP)
KUSHIBIKI, Ryousuke (Tanaka Kikinzoku Kogyo K.K.22, Wadai, Tsukuba-sh, Ibaraki 47, 〒3004247, JP)
YAMAMOTO, Toshiya (Tanaka Kikinzoku Kogyo K.K.22, Wadai, Tsukuba-sh, Ibaraki 47, 〒3004247, JP)
SAITO, Shin (2-1-1 Katahira, Aoba-ku, Sendai-sh, Miyagi 77, 〒9808577, JP)
HINATA, Shintaro (2-1-1 Katahira, Aoba-ku, Sendai-sh, Miyagi 77, 〒9808577, JP)
Application Number:
JP2017/036824
Publication Date:
May 11, 2018
Filing Date:
October 11, 2017
Export Citation:
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Assignee:
TANAKA KIKINZOKU KOGYO K.K. (TOKYO BUILDING, 7-3 Marunouchi 2-chome, Chiyoda-k, Tokyo 22, 〒1006422, JP)
TOHOKU UNIVERSITY (2-1-1, Katahira Aoba-ku, Sendai-sh, Miyagi 77, 〒9808577, JP)
International Classes:
G11B5/851; C22C5/04; C22C19/07; C22C32/00; C23C14/06; C23C14/34; G11B5/65
Domestic Patent References:
WO2016133047A12016-08-25
Foreign References:
JP2015032336A2015-02-16
JP2007004957A2007-01-11
Attorney, Agent or Firm:
MATSUYAMA, Keisuke et al. (Dai5-Mizuho Bldg, 21-7 Sendagaya 5-chome, Shibuya-k, Tokyo 51, 〒1510051, JP)
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