Title:
SPUTTERING TARGET FOR MANUFACTURING THERMALLY ASSISTED MAGNETIC RECORDING MEDIUM
Document Type and Number:
WIPO Patent Application WO/2023/038016
Kind Code:
A1
Abstract:
A sputtering target is provided which enables manufacturing a heat assisted magnetic recording medium that has high saturation magnetization and few in-plane oriented magnetic grains. This sputtering target, for producing a heat assisted magnetic recording medium, includes: a magnetic phase that contains Fe and Pt; and a nitride non-magnetic phase selected from Cr2N, VN, AlN, NbN, TaN, HfN and any combination of these.
Inventors:
THAM KIM KONG (JP)
KUSHIBIKI RYOUSUKE (JP)
SAITO SHIN (JP)
KUSHIBIKI RYOUSUKE (JP)
SAITO SHIN (JP)
Application Number:
PCT/JP2022/033348
Publication Date:
March 16, 2023
Filing Date:
September 06, 2022
Export Citation:
Assignee:
TANAKA PRECIOUS METAL IND (JP)
UNIV TOHOKU (JP)
UNIV TOHOKU (JP)
International Classes:
G11B5/851; C23C14/34; G11B5/02; G11B5/65; H01F41/18
Foreign References:
| JP2018035434A | 2018-03-08 | |||
| JP2016085773A | 2016-05-19 | |||
| JP2014078304A | 2014-05-01 |
Attorney, Agent or Firm:
YAMAMOTO, Osamu et al. (JP)
Download PDF: