Title:
SPUTTERING TARGET MATERIAL
Document Type and Number:
WIPO Patent Application WO/2017/002851
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a sintered alloy having high mechanical strength (particularly high toughness suitable for a sputtering target material) and a sputtering target material which includes the sintered alloy, and the present invention provides a sintered alloy containing: an A-group element comprising Mn and one or more of Ga, Zn, Sn, Ge, Al, and Co; and, as needed, a B-group element comprising one or more of Fe, Ni, Cu, Ti, V, Cr, Si, Y, Zr, Nb, Mo, Ru, Rh, Pd, Ag, In, Ta, W, Re, Ir, Pt, Au, Bi, La, Ce, Nd, Sm, Gd, Tb, Dy, and Ho; the remainder being unavoidable impurities, the sintered alloy having one or more types of first through sixth Mn phases satisfying a predetermined condition.
Inventors:
HASEGAWA HIROYUKI (JP)
MATSUBARA NORIAKI (JP)
MATSUBARA NORIAKI (JP)
Application Number:
PCT/JP2016/069261
Publication Date:
January 05, 2017
Filing Date:
June 29, 2016
Export Citation:
Assignee:
SANYO SPECIAL STEEL CO LTD (JP)
International Classes:
C22C30/00; B22F3/00; C22C5/06; C22C9/00; C22C9/01; C22C9/02; C22C9/04; C22C9/05; C22C9/06; C22C9/10; C22C13/00; C22C14/00; C22C16/00; C22C18/00; C22C18/02; C22C18/04; C22C19/00; C22C21/00; C22C22/00; C22C27/02; C22C27/04; C22C27/06; C22C28/00; C22C38/00; C23C14/34
Domestic Patent References:
| WO2014115057A1 | 2014-07-31 |
Foreign References:
| JP2009074127A | 2009-04-09 | |||
| JP2006041511A | 2006-02-09 |
Attorney, Agent or Firm:
NAGAI Hiroshi et al. (JP)
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