SPUTTERING TARGET MATERIAL AND SPUTTERING TARGET

Title:

SPUTTERING TARGET MATERIAL AND SPUTTERING TARGET

Document Type and Number:

WIPO Patent Application WO/2019/176414

Kind Code:

A1

Abstract:

One embodiment of the present invention is a sputtering target material which contains an oxide of zinc (Zn), an oxide of tin (Sn) and an oxide of zirconium (Zr), but does not contain indium (In), and wherein: relative to all elements other than oxygen (O), the zinc content AZn is more than 0 at% but 50 at% or less, the tin content ASn is from 20 at% to 80 at% (inclusive), and the zirconium content AZr is more than 0 at% but 40 at% or less; the Zn content AZn satisfies formula (1); the ratio of the maximum value to the minimum value among the plurality of measured specific resistances is 3 or less; and the specific resistances are 5 × 10-1 (Ω·cm) or less. (1): AZn/(AZn + ASn) ≤ 0.6

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Inventors:

TAO YUKI
HATA HIDEO

Application Number:

PCT/JP2019/004915

Publication Date:

September 19, 2019

Filing Date:

February 12, 2019

Export Citation:

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Assignee:

KOBELCO RES INSTITUTE INC (JP)

International Classes:

C23C14/34; C01G25/00; C04B35/457; G11B7/2578; G11B7/26

Domestic Patent References:

WO2012141066A1	2012-10-18
WO2012165047A1	2012-12-06

Foreign References:

JP2014167162A	2014-09-11
JP2014167163A	2014-09-11
JP2009123957A	2009-06-04
JP2019052373A	2019-04-04

Attorney, Agent or Firm:

AMANO Kazunori (JP)

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