SPUTTERING TARGET, METHOD FOR PRODUCING LAMINATED FILM, LAMINATED FILM, AND MAGNETIC RECORDING MEDIUM

Title:

SPUTTERING TARGET, METHOD FOR PRODUCING LAMINATED FILM, LAMINATED FILM, AND MAGNETIC RECORDING MEDIUM

Document Type and Number:

WIPO Patent Application WO/2019/058819

Kind Code:

A1

Abstract:

This sputtering target contains Co and Pt as metal components, and the molar ratio of the Pt content to the Co content is 5/100 to 45/100. The sputtering target also contains Nb2O5 as a metal oxide component.

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Inventors:

SHIMIZU MASAYOSHI (JP)
IWABUCHI YASUYUKI (JP)
MASUDA MANAMI (JP)

Application Number:

PCT/JP2018/030435

Publication Date:

March 28, 2019

Filing Date:

August 16, 2018

Export Citation:

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Assignee:

JX NIPPON MINING & METALS CORP (JP)

International Classes:

C23C14/34; C23C14/06; G11B5/64; G11B5/851; H01F41/18

Domestic Patent References:

WO2011016365A1

2011-02-10

Foreign References:

JP2001026860A	2001-01-30
JP2010176727A	2010-08-12
JP2006299401A	2006-11-02

Attorney, Agent or Firm:

AXIS PATENT INTERNATIONAL (JP)

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