Title:
SPUTTERING TARGET AND METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING MAGNETIC RECORDING MEDIUM
Document Type and Number:
WIPO Patent Application WO/2019/187243
Kind Code:
A1
Abstract:
[Problem] To provide a method for producing a sputtering target which contains a metal which is one or more types of Fe, Co, Cr and Pt, also contains one or more types of C and BN, and generates few particles. [Solution] A sputtering target which contains at least one type of metal phase selected from the group consisting of Fe, Co, Cr and Pt, and also contains at least one type of non-metal phase selected from the group consisting of C and BN, wherein A≤40 and A/B≤1.7. (Herein, A is the number of boundaries between the metal phase and non-metal phase along a line segment having a length of 500μm and drawn in the vertical direction in a structure photograph, and B is the number of boundaries between the metal phase and non-metal phase along a line segment having a length of 500μm and drawn in the horizontal direction in a structure photograph)
Inventors:
OGINO SHIN-ICHI (JP)
Application Number:
PCT/JP2018/036501
Publication Date:
October 03, 2019
Filing Date:
September 28, 2018
Export Citation:
Assignee:
JX NIPPON MINING & METALS CORP (JP)
International Classes:
C23C14/34; B22F1/052; B22F3/14; B22F3/15; B22F9/08; C22C1/05; C22C29/00; C22C29/16; C22C32/00; C23C14/06; G11B5/851
Domestic Patent References:
| WO2014132746A1 | 2014-09-04 | |||
| WO2018047978A1 | 2018-03-15 | |||
| WO2015080009A1 | 2015-06-04 |
Foreign References:
| JP2012102387A | 2012-05-31 | |||
| JP2012178211A | 2012-09-13 | |||
| JP2018035434A | 2018-03-08 | |||
| JP2003303787A | 2003-10-24 | |||
| JPH05331635A | 1993-12-14 |
Attorney, Agent or Firm:
AXIS PATENT INTERNATIONAL (JP)
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