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Title:
SPUTTERING TARGET FOR PRODUCTION OF METALLIC GLASS FILM AND PROCESS FOR PRODUCING THE SAME
Document Type and Number:
WIPO Patent Application WO/2006/051737
Kind Code:
A1
Abstract:
A sputtering target for production of metallic glass film, characterized in that it has a structure obtained by sintering of an atomized powder of ≤ 50 μm average particle diameter having a composition of three or more elements whose main component (component of greatest atomic %) is at least one metal element selected from among Pd, Zr, Fe, Co, Cu and Ni. It is intended to provide a sputtering target for production of metallic glass film that in place of the high-cost conventional bulk metallic glass produced by quenching of a molten metal, is free from the problems of defects and composition heterogeneity of produced metallic glass film, and that has a homogeneous structure and can be produced efficiently at low cost, and that reduces the occurrence of nodules and particles, and to provide a process for producing the same.

Inventors:
NAKAMURA ATSUSHI (JP)
YAHAGI MASATAKA (JP)
INOUE AKIHISA (JP)
KIMURA HISAMICHI (JP)
YAMAURA SHIN-ICHI (JP)
Application Number:
PCT/JP2005/020278
Publication Date:
May 18, 2006
Filing Date:
November 04, 2005
Export Citation:
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Assignee:
NIKKO MATERIALS CO LTD (JP)
UNIV TOHOKU (JP)
NAKAMURA ATSUSHI (JP)
YAHAGI MASATAKA (JP)
INOE AKIHISA (JP)
KIMURA HISAMICHI (JP)
YAMAURA SHIN-ICHI (JP)
International Classes:
C23C14/34; B22F9/08; C22C5/04; C22C9/00; C22C16/00; C22C19/03; C22C19/07; C22C38/00
Domestic Patent References:
WO2005012591A12005-02-10
Foreign References:
JPS6464207A1989-03-10
JP2001295035A2001-10-26
JP2002226970A2002-08-14
JP2003201560A2003-07-18
JP2003003222A2003-01-08
US6159625A2000-12-12
Other References:
"Functional Material", vol. 22, June 2002, article "Manufacturing Method of Bulk Metallic Glass", pages: 26 - 31
Attorney, Agent or Firm:
Ogoshi, Isamu (Daini-Toranomon Denki Bldg. 5F, 3-1-10, Toranomo, Minato-ku Tokyo, JP)
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