Title:
SPUTTERING TARGET, AND TRANSPARENT CONDUCTIVE THIN FILM MANUFACTURED THEREFROM
Document Type and Number:
WIPO Patent Application WO/2018/110732
Kind Code:
A1
Abstract:
The present invention relates to a sputtering target having low resistivity, and a transparent conductive thin film formed therefrom, the sputtering target: comprising a sintered body comprising a compound represented by In2O3(ZnO)m (m is an integer of 2-7) and an oxide having a +3 or more valent element; having a +3 or more valent element atomic amount of 1.5-5 atom% on the basis of the total atomic amount; having a resistivity of 1.80×10-4 - 5.0×10-4 Ω·cm; and simultaneously enabling low resistance to be exhibited and high light transmittance and high-temperature crystallization characteristics to be improved.
Inventors:
HWANG BYUNG JIN (KR)
LEE SEUNG YI (KR)
YANG SEUNG HO (KR)
PARK JOO HYEON (KR)
LEE SEUNG YI (KR)
YANG SEUNG HO (KR)
PARK JOO HYEON (KR)
Application Number:
PCT/KR2016/014669
Publication Date:
June 21, 2018
Filing Date:
December 14, 2016
Export Citation:
Assignee:
HEE SUNG METAL LTD (KR)
International Classes:
C23C14/34; H01B1/02; H01B13/00; H01L27/32; H01L51/52
Foreign References:
JP2011074479A | 2011-04-14 | |||
KR20110020901A | 2011-03-03 | |||
KR20130021621A | 2013-03-06 | |||
JP2012144410A | 2012-08-02 | |||
KR20150125726A | 2015-11-09 |
Attorney, Agent or Firm:
HANBEOT PATENT & LAW FIRM (KR)
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